| Presentation | 2019-11-15 Lithography Hotspot Detection Based on Feature Vectors Considering Wire Width and Distance Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In lithography, which is one of the semiconductor manufacturing processes, there is a pattern that is highly likely to cause an undesired short- or open-circuit, called a hotspot. Since the lithography simulation used for hotspot detection requires a very long computation time, a method to more quickly detect hotspot candidates is required. In recent years, methods using machine learning have been attracting attention as a method to more quickly detect hotspot candidates. In our previous study, we proposed methods that use feature vectors considering the distance between adjacent wires, which can be correlated with an undesired short-circuit. In this paper, we extend the previously proposed feature vectors to consider the widths of wires, which can be correlated with undesired open-circuits, and confirm its effectiveness. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | lithography / hotspot / machine-learning / classification accuracy |
| Paper # | VLD2019-51,DC2019-75 |
| Date of Issue | 2019-11-06 (VLD, DC) |
| Conference Information | |
| Committee | VLD / DC / CPSY / RECONF / ICD / IE / IPSJ-SLDM / IPSJ-EMB / IPSJ-ARC |
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| Conference Date | 2019/11/13(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Ehime Prefecture Gender Equality Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2019 -New Field of VLSI Design- |
| Chair | Nozomu Togawa(Waseda Univ.) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Yuichiro Shibata(Nagasaki Univ.) / Makoto Nagata(Kobe Univ.) / Hideaki Kimata(NTT) / Yutaka Tamiya(Fujitsu Lab.) / / Hiroshi Inoue(Kyushu Univ.) |
| Vice Chair | Daisuke Fukuda(Fujitsu Labs.) / Hiroshi Takahashi(Ehime Univ.) / Michihiro Koibuchi(NII) / Kota Nakajima(Fujitsu Lab.) / Kentaro Sano(RIKEN) / Yoshiki Yamaguchi(Tsukuba Univ.) / Masafumi Takahashi(Toshiba-memory) / Kazuya Kodama(NII) / Keita Takahashi(Nagoya Univ.) |
| Secretary | Daisuke Fukuda(Univ. of Aizu) / Hiroshi Takahashi(Hitachi) / Michihiro Koibuchi(Nihon Univ.) / Kota Nakajima(Chiba Univ.) / Kentaro Sano(Nagoya Inst. of Tech.) / Yoshiki Yamaguchi(Hokkaido Univ.) / Masafumi Takahashi(Hiroshima City Univ.) / Kazuya Kodama(e-trees.Japan) / Keita Takahashi(Tohoku Univ.) / (Socionext) / (NTT) / (NHK) |
| Assistant | Kazuki Ikeda(Hitachi) / / Eiji Arima(Univ. of Tokyo) / Shugo Ogawa(Hitachi) / Yuuki Kobayashi(NEC) / Hiroki Nakahara(Tokyo Inst. of Tech.) / Tetsuya Hirose(Osaka Univ.) / Koji Nii(Floadia) / Takeshi Kuboki(Kyushu Univ.) / Kyohei Unno(KDDI Research) / Norishige Fukushima(Nagoya Inst. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering / Special Interest Group on System and LSI Design Methodology / Special Interest Group on Embedded Systems / Special Interest Group on System Architecture |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Lithography Hotspot Detection Based on Feature Vectors Considering Wire Width and Distance |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | hotspot |
| Keyword(3) | machine-learning |
| Keyword(4) | classification accuracy |
| 1st Author's Name | Gaku Kataoka |
| 1st Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| 2nd Author's Name | Masato Inagi |
| 2nd Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| 3rd Author's Name | Shinobu Nagayama |
| 3rd Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| 4th Author's Name | Shin'ichi Wakabayashi |
| 4th Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| Date | 2019-11-15 |
| Paper # | VLD2019-51,DC2019-75 |
| Volume (vol) | vol.119 |
| Number (no) | VLD-282,DC-283 |
| Page | pp.pp.185-190(VLD), pp.185-190(DC), |
| #Pages | 6 |
| Date of Issue | 2019-11-06 (VLD, DC) |