| Presentation | 2019-11-14 NBTI Model Replicating AC Stress/Recovery from a Single-shot Long-term DC Measurement Takumi Hosaka, Shinichi Nishizawa, RYO Kishida, Takashi Matsumoto, Kazutoshi Kobayashi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In this paper, simple and compact Negative Bias Temperature Instability (NBTI) model is proposed. The model is based on the reaction-diffusion (tn) and hole-trapping (log(t)) theories. Data with a single shot of DC stress and recovery are utilized to extract model parameters. Our key idea is setting the priority in the model fitting process to be possible for replicating AC dependency of NBTI stress and recovery effect. The proposed model successfully replicates stress and recovery with various duty cycles. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | negative bias temperature instability (NBTI) / AC stress dependency / reaction diffusion / hole trapping |
| Paper # | VLD2019-35,DC2019-59 |
| Date of Issue | 2019-11-06 (VLD, DC) |
| Conference Information | |
| Committee | VLD / DC / CPSY / RECONF / ICD / IE / IPSJ-SLDM / IPSJ-EMB / IPSJ-ARC |
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| Conference Date | 2019/11/13(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Ehime Prefecture Gender Equality Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2019 -New Field of VLSI Design- |
| Chair | Nozomu Togawa(Waseda Univ.) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Yuichiro Shibata(Nagasaki Univ.) / Makoto Nagata(Kobe Univ.) / Hideaki Kimata(NTT) / Yutaka Tamiya(Fujitsu Lab.) / / Hiroshi Inoue(Kyushu Univ.) |
| Vice Chair | Daisuke Fukuda(Fujitsu Labs.) / Hiroshi Takahashi(Ehime Univ.) / Michihiro Koibuchi(NII) / Kota Nakajima(Fujitsu Lab.) / Kentaro Sano(RIKEN) / Yoshiki Yamaguchi(Tsukuba Univ.) / Masafumi Takahashi(Toshiba-memory) / Kazuya Kodama(NII) / Keita Takahashi(Nagoya Univ.) |
| Secretary | Daisuke Fukuda(Univ. of Aizu) / Hiroshi Takahashi(Hitachi) / Michihiro Koibuchi(Nihon Univ.) / Kota Nakajima(Chiba Univ.) / Kentaro Sano(Nagoya Inst. of Tech.) / Yoshiki Yamaguchi(Hokkaido Univ.) / Masafumi Takahashi(Hiroshima City Univ.) / Kazuya Kodama(e-trees.Japan) / Keita Takahashi(Tohoku Univ.) / (Socionext) / (NTT) / (NHK) |
| Assistant | Kazuki Ikeda(Hitachi) / / Eiji Arima(Univ. of Tokyo) / Shugo Ogawa(Hitachi) / Yuuki Kobayashi(NEC) / Hiroki Nakahara(Tokyo Inst. of Tech.) / Tetsuya Hirose(Osaka Univ.) / Koji Nii(Floadia) / Takeshi Kuboki(Kyushu Univ.) / Kyohei Unno(KDDI Research) / Norishige Fukushima(Nagoya Inst. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering / Special Interest Group on System and LSI Design Methodology / Special Interest Group on Embedded Systems / Special Interest Group on System Architecture |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | NBTI Model Replicating AC Stress/Recovery from a Single-shot Long-term DC Measurement |
| Sub Title (in English) | |
| Keyword(1) | negative bias temperature instability (NBTI) |
| Keyword(2) | AC stress dependency |
| Keyword(3) | reaction diffusion |
| Keyword(4) | hole trapping |
| 1st Author's Name | Takumi Hosaka |
| 1st Author's Affiliation | Saitama University(Saitama Univ.) |
| 2nd Author's Name | Shinichi Nishizawa |
| 2nd Author's Affiliation | Fukuoka University(Fukuoka Univ.) |
| 3rd Author's Name | RYO Kishida |
| 3rd Author's Affiliation | Tokyo university of Science(Tokyo Univ. of Science) |
| 4th Author's Name | Takashi Matsumoto |
| 4th Author's Affiliation | The University of Tokyo(The Univ. of Tokyo) |
| 5th Author's Name | Kazutoshi Kobayashi |
| 5th Author's Affiliation | Kyoto Institute of Technology(Kyoto Institute of Tech.) |
| Date | 2019-11-14 |
| Paper # | VLD2019-35,DC2019-59 |
| Volume (vol) | vol.119 |
| Number (no) | VLD-282,DC-283 |
| Page | pp.pp.57-62(VLD), pp.57-62(DC), |
| #Pages | 6 |
| Date of Issue | 2019-11-06 (VLD, DC) |