Presentation | 2019-10-23 The investigation of interface property of N-doped LaB6/SiO2/Si(100) stack structure by increasing deposition temperature Kyung Eun Park, Hideki Kamata, Shun-ichiro Ohmi, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | SDM2019-55 |
Date of Issue | 2019-10-16 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2019/10/23(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Niche, Tohoku Univ. |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Process Science and New Process Technology |
Chair | Takahiro Shinada(Tohoku Univ.) |
Vice Chair | Hiroshige Hirano(TowerJazz Panasonic) |
Secretary | Hiroshige Hirano(Shizuoka Univ.) |
Assistant | Takahiro Mori(AIST) / Nobuaki Kobayashi(Nihon Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | The investigation of interface property of N-doped LaB6/SiO2/Si(100) stack structure by increasing deposition temperature |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Kyung Eun Park |
1st Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
2nd Author's Name | Hideki Kamata |
2nd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
3rd Author's Name | Shun-ichiro Ohmi |
3rd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
Date | 2019-10-23 |
Paper # | SDM2019-55 |
Volume (vol) | vol.119 |
Number (no) | SDM-239 |
Page | pp.pp.11-15(SDM), |
#Pages | 5 |
Date of Issue | 2019-10-16 (SDM) |