| Presentation | 2019-10-24 Gas concentration distribution measurement in semiconductor process chamber using a high SNR CMOS absorption image sensor Keigo Takahashi, Yhang Ricardo Sipauba Carvalho da Silva, Rihito Kuroda, Yasuyuki Fujihara, Maasa Murata, Hidekazu Ishii, Tatsuo Morimoto, Tomoyuki Suwa, Akinobu Teramoto, Shigetoshi Sugawa, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | This paper reports on gas concentration imaging using lateral overflow integration trench capacitor(LOFITreC) CMOS absorption image sensor with signal-to-noise ratio (SNR) over 70 dB and high light resistance in the ultraviolet wavelength band. Two-dimensional absorption imaging of the concentration of NO2 gas flowing in a semiconductor process chamber was experimented using the developed sensor and a 405 nm LED light source. As a result, a good calibration curve of NO2 gas was obtained, and the concentration distribution of NO2 gas flowing in a process chamber was visualized. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Spectral imaging / Concentration sensor / Absorption spectrometry / CMOS image sensor |
| Paper # | SDM2019-66 |
| Date of Issue | 2019-10-16 (SDM) |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 2019/10/23(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Niche, Tohoku Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process Science and New Process Technology |
| Chair | Takahiro Shinada(Tohoku Univ.) |
| Vice Chair | Hiroshige Hirano(TowerJazz Panasonic) |
| Secretary | Hiroshige Hirano(Shizuoka Univ.) |
| Assistant | Takahiro Mori(AIST) / Nobuaki Kobayashi(Nihon Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Gas concentration distribution measurement in semiconductor process chamber using a high SNR CMOS absorption image sensor |
| Sub Title (in English) | |
| Keyword(1) | Spectral imaging |
| Keyword(2) | Concentration sensor |
| Keyword(3) | Absorption spectrometry |
| Keyword(4) | CMOS image sensor |
| 1st Author's Name | Keigo Takahashi |
| 1st Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 2nd Author's Name | Yhang Ricardo Sipauba Carvalho da Silva |
| 2nd Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 3rd Author's Name | Rihito Kuroda |
| 3rd Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 4th Author's Name | Yasuyuki Fujihara |
| 4th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 5th Author's Name | Maasa Murata |
| 5th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 6th Author's Name | Hidekazu Ishii |
| 6th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 7th Author's Name | Tatsuo Morimoto |
| 7th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 8th Author's Name | Tomoyuki Suwa |
| 8th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 9th Author's Name | Akinobu Teramoto |
| 9th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| 10th Author's Name | Shigetoshi Sugawa |
| 10th Author's Affiliation | Tohoku University(Tohoku Univ.) |
| Date | 2019-10-24 |
| Paper # | SDM2019-66 |
| Volume (vol) | vol.119 |
| Number (no) | SDM-239 |
| Page | pp.pp.65-68(SDM), |
| #Pages | 4 |
| Date of Issue | 2019-10-16 (SDM) |