Presentation | 2019-10-24 [Invited Lecture] Effect of an oxide layer at Co/Si interface on Schottky barrier height and contact resistivity Koichi Kido, Ken Sato, Rihito Kuroda, Daisuke Ando, Yuji Suto, Junichi Koike, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | SDM2019-60 |
Date of Issue | 2019-10-16 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2019/10/23(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Niche, Tohoku Univ. |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Process Science and New Process Technology |
Chair | Takahiro Shinada(Tohoku Univ.) |
Vice Chair | Hiroshige Hirano(TowerJazz Panasonic) |
Secretary | Hiroshige Hirano(Shizuoka Univ.) |
Assistant | Takahiro Mori(AIST) / Nobuaki Kobayashi(Nihon Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Lecture] Effect of an oxide layer at Co/Si interface on Schottky barrier height and contact resistivity |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Koichi Kido |
1st Author's Affiliation | Tohoku University(Tohoku Univ.) |
2nd Author's Name | Ken Sato |
2nd Author's Affiliation | Tohoku University(Tohoku Univ.) |
3rd Author's Name | Rihito Kuroda |
3rd Author's Affiliation | Tohoku University(Tohoku Univ.) |
4th Author's Name | Daisuke Ando |
4th Author's Affiliation | Tohoku University(Tohoku Univ.) |
5th Author's Name | Yuji Suto |
5th Author's Affiliation | Tohoku University(Tohoku Univ.) |
6th Author's Name | Junichi Koike |
6th Author's Affiliation | Tohoku University(Tohoku Univ.) |
Date | 2019-10-24 |
Paper # | SDM2019-60 |
Volume (vol) | vol.119 |
Number (no) | SDM-239 |
Page | pp.pp.35-38(SDM), |
#Pages | 4 |
Date of Issue | 2019-10-16 (SDM) |