Presentation | 2019-10-24 [Invited Talk] Random nanostructure formation and electric readout for nano-artifact metrics Seiya Kasai, Renpeng Lu, Katsumi Shimizu, Xiang Yin, Yosuke Ueba, Mikio Ishikawa, Mitsuru Kitamura, Morihisa Hoga, Makoto Naruse, Tsutomu Matsumoto, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We introduce a basic concept of nano-artifact metrics, expected to be a highly secure authentication technique using nano-scale random structures. Recent development of the basic technologies for the nano-artifact metrics including formation of two-dimensional random nanostructure using a resist collapse and a novel electric readout of the formed nanostructures. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Artifact metrics / Random nanostructure / Resist collapse / Electric readout / Si MOSFET |
Paper # | SDM2019-62 |
Date of Issue | 2019-10-16 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2019/10/23(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Niche, Tohoku Univ. |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Process Science and New Process Technology |
Chair | Takahiro Shinada(Tohoku Univ.) |
Vice Chair | Hiroshige Hirano(TowerJazz Panasonic) |
Secretary | Hiroshige Hirano(Shizuoka Univ.) |
Assistant | Takahiro Mori(AIST) / Nobuaki Kobayashi(Nihon Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Talk] Random nanostructure formation and electric readout for nano-artifact metrics |
Sub Title (in English) | |
Keyword(1) | Artifact metrics |
Keyword(2) | Random nanostructure |
Keyword(3) | Resist collapse |
Keyword(4) | Electric readout |
Keyword(5) | Si MOSFET |
1st Author's Name | Seiya Kasai |
1st Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
2nd Author's Name | Renpeng Lu |
2nd Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
3rd Author's Name | Katsumi Shimizu |
3rd Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
4th Author's Name | Xiang Yin |
4th Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
5th Author's Name | Yosuke Ueba |
5th Author's Affiliation | Dai Nippon Printing(DNP) |
6th Author's Name | Mikio Ishikawa |
6th Author's Affiliation | Dai Nippon Printing(DNP) |
7th Author's Name | Mitsuru Kitamura |
7th Author's Affiliation | Dai Nippon Printing(DNP) |
8th Author's Name | Morihisa Hoga |
8th Author's Affiliation | National Institute of Advanced Industrial Science and Technology(AIST) |
9th Author's Name | Makoto Naruse |
9th Author's Affiliation | The University of Tokyo(Univ. of Tokyo) |
10th Author's Name | Tsutomu Matsumoto |
10th Author's Affiliation | Yokohama National University(YNU) |
Date | 2019-10-24 |
Paper # | SDM2019-62 |
Volume (vol) | vol.119 |
Number (no) | SDM-239 |
Page | pp.pp.45-50(SDM), |
#Pages | 6 |
Date of Issue | 2019-10-16 (SDM) |