| Presentation | 2019-10-23 [Invited Talk] Atomic layer etching process utilizing plasma Sho Kumakura, Yoshihide Kihara, Masanobu Honda, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | |
| Paper # | SDM2019-53 |
| Date of Issue | 2019-10-16 (SDM) |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 2019/10/23(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Niche, Tohoku Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process Science and New Process Technology |
| Chair | Takahiro Shinada(Tohoku Univ.) |
| Vice Chair | Hiroshige Hirano(TowerJazz Panasonic) |
| Secretary | Hiroshige Hirano(Shizuoka Univ.) |
| Assistant | Takahiro Mori(AIST) / Nobuaki Kobayashi(Nihon Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Invited Talk] Atomic layer etching process utilizing plasma |
| Sub Title (in English) | |
| Keyword(1) | |
| Keyword(2) | |
| Keyword(3) | |
| Keyword(4) | |
| 1st Author's Name | Sho Kumakura |
| 1st Author's Affiliation | Tokyo Electron Miyagi Ltd.(Tokyo Electron Miyagi) |
| 2nd Author's Name | Yoshihide Kihara |
| 2nd Author's Affiliation | Tokyo Electron Miyagi Ltd.(Tokyo Electron Miyagi) |
| 3rd Author's Name | Masanobu Honda |
| 3rd Author's Affiliation | Tokyo Electron Miyagi Ltd.(Tokyo Electron Miyagi) |
| Date | 2019-10-23 |
| Paper # | SDM2019-53 |
| Volume (vol) | vol.119 |
| Number (no) | SDM-239 |
| Page | pp.pp.1-6(SDM), |
| #Pages | 6 |
| Date of Issue | 2019-10-16 (SDM) |