Presentation | 2019-02-07 [Invited Talk] New contact material for advanced CMOS: cluster-preforming-deposited amorphous Si-rich W silicide film Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Toshihiko Kanayama, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | SDM2018-96 |
Date of Issue | 2019-01-31 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2019/2/7(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Backend / Assembly and Related materials technology |
Chair | Takahiro Shinada(Tohoku Univ.) |
Vice Chair | Hiroshige Hirano(TowerJazz Panasonic) |
Secretary | Hiroshige Hirano(Shizuoka Univ.) |
Assistant | Takahiro Mori(AIST) / Nobuaki Kobayashi(Nihon Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Talk] New contact material for advanced CMOS: cluster-preforming-deposited amorphous Si-rich W silicide film |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Naoya Okada |
1st Author's Affiliation | National Institute of Advanced Industrial Science & Technology(AIST) |
2nd Author's Name | Noriyuki Uchida |
2nd Author's Affiliation | National Institute of Advanced Industrial Science & Technology(AIST) |
3rd Author's Name | Shinichi Ogawa |
3rd Author's Affiliation | National Institute of Advanced Industrial Science & Technology(AIST) |
4th Author's Name | Toshihiko Kanayama |
4th Author's Affiliation | National Institute of Advanced Industrial Science & Technology(AIST) |
Date | 2019-02-07 |
Paper # | SDM2018-96 |
Volume (vol) | vol.118 |
Number (no) | SDM-438 |
Page | pp.pp.23-26(SDM), |
#Pages | 4 |
Date of Issue | 2019-01-31 (SDM) |