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| Presentation | 2017-04-21 10:00 Plasma fusion CMP® technology for GaN substrates -- Evaluation of processing characteristics for plasma fusion CMP® using Ar plasma and ethanol bubbling -- Naoki Yamazaki (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Toshiro Doi (Kyushu Univ), Hideo Aida (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Seongwoo Kim, Koki Oyama (Namiki PrecisionJewel Co.,LTD), Shuhei Kurokawa (Kyushu Univ), Yasuhisa Sano (Osaka Univ.), Masaharu Shiratani, Yoko Yamanishi (Kyushu Univ) |
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| PDF Download Link |  SDM2017-5 OME2017-5 Link to ES Tech. Rep. Archives: SDM2017-5 OME2017-5 |
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