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Presentation |
2014-12-12 17:00
Atomic Layer Deposition of Al2O3 Film Utilizing Water Vapor Plasma Oxidation Tomoaki Umehara, Masahiro Horita, Koji Yoshitsugu, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) |
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EID2014-36 SDM2014-131 Link to ES Tech. Rep. Archives: EID2014-36 SDM2014-131 |
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