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| Presentation | 2011-10-20 15:45 On the relation between interface flattening effect and insulator breakdown characteristic of radical reaction based insulator formation technology Rihito Kuroda, Akinobu Teramoto, Xiang Li, Tomoyuki Suwa, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ.) |
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| PDF Download Link |  SDM2011-101 Link to ES Tech. Rep. Archives: SDM2011-101 |
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