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| Presentation | 2009-04-24 13:25 Growth of polycrystalline Si on plastic substrate using pulsed-plasma CVD under near atmospheric Pressure Shogo Murashige, Mitsutaka Matsumoto, Yohei Inayoshi, Maki Suemitsu (Tohoku Univ.), Setsuo Nakajima, Tsuyoshi Uehara (Sekisui Chemicals Co. Ltd), Yasutake Toyoshima (AIST-ETRI) |
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| PDF Download Link |  ED2009-15 Link to ES Tech. Rep. Archives: ED2009-15 |
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