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| Presentation | 2006-10-06 16:50 Effects of ion damage reduction due to N2+ on InN film growth on Si substrate by ECR-MBE method Tokuo Yodo, Teruya Shimada, Sumito Tagawa, Ryo Nishimoto, Shiro Hidaka, Keita Ishi, Hiroshi Segawa, Junichi Hirakawa, Yoshiyuki Harada (Osaka Inst.of Tech.) |
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| PDF Download Link | Link to ES Tech. Rep. Archives:  ED2006-175 CPM2006-112 LQE2006-79 |
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