Information and Systems-Image Engineering(Date:2022/10/19)

Presentation
[Invited Talk] Needs for X-ray Optical Elements

Wataru Yashiro(Tohoku Univ.),  

[Date]2022-10-19
[Paper #]SDM2022-54
[Invited Talk] Fabrication of organic ferroelectric transistors using paper substrates and application to organic solar cells

Park Byung Eun(University of Seoul),  

[Date]2022-10-19
[Paper #]SDM2022-60
Evaluation and analysis of ferroelectric BiFeO3 thin film surface

Fuminobu Imaizumi(NIT, Oyama),  

[Date]2022-10-19
[Paper #]SDM2022-58
[Invited Talk] Fabrication of monolayer h-BN/LaB6 heterostructure using thermally aggregation method and its evaluation

Katsumi Nagaoka(NIMS),  Takashi Aizawa(NIMS),  Shun-ichiro Ohmi(NIMS),  

[Date]2022-10-19
[Paper #]SDM2022-57
The effect of microstructures of CrSiC thin film resistors on the electrical properties

Nozomi Ito(Renesas),  Kazuyoshi Maekawa(Renesas),  Yuji Takahashi(Renesas),  Takashi Tonegawa(Renesas),  

[Date]2022-10-19
[Paper #]SDM2022-59
A study on low-voltage operation of pentacene-based floating-gate memory utilizing Ar/N2-plasma nitridation with N-doped LaB6 metal and high-k LaBxNy insulator

Eun-Ki Hong(Tokyo Tech.),  Shun-ichiro Ohmi(Tokyo Tech.),  

[Date]2022-10-19
[Paper #]SDM2022-61
Resistance Masurement Technology for Statistical Analysis of Thin Films Materials for Emerging Memory with High Accuracy and Wide Range

Hidemi Mitsuda(Tohoku Univ),  Ryousuke Tenman(Tohoku Univ),  Takezou Mawaki(Tohoku Univ),  Rihito Kuroda(Tohoku Univ),  

[Date]2022-10-19
[Paper #]SDM2022-55
[Invited Talk] Reliability improvement of SiC MOSFET by high-temperature CO2 annealing

Takuji Hosoi(Kwansei Gakuin Univ.),  Takayoshi Shimura(Osaka Univ.),  Heiji Watanabe(Osaka Univ.),  

[Date]2022-10-19
[Paper #]SDM2022-62
A study on threshold voltage control of MFSFET utilizing ferroelectric nondoped HfO2 thin films

Masakazu Tanuma(Tokyo Tech),  Joong-Won Shin(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2022-10-19
[Paper #]SDM2022-63
A study on threshold voltage control of MFSFET with ultrathin ferroelectric nondoped HfO2 gate insulator for analog memory applications

Joong-Won Shin(Tokyo Tech),  Masakazu Tanuma(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2022-10-19
[Paper #]SDM2022-56