Electronics-Silicon Devices and Materials(Date:2015/10/29)

Presentation
[Invited Talk] Low-power and high-speed FPGA by adjacent integration of flash memory and CMOS logic

Koichiro Zaitsu(Toshiba),  Kosuke Tatsumura(Toshiba),  Mari Matsumoto(Toshiba),  Masato Oda(Toshiba),  Shinichi Yasuda(Toshiba),  

[Date]2015-10-29
[Paper #]SDM2015-75
[Invited Talk] Current situation and challenging for ion implantation technology

Yoshiki Nakashima(NIC),  Nariaki Hamamoto(NIC),  Shigeki Sakai(NIC),  Hiroshi Onoda(NIC),  

[Date]2015-10-29
[Paper #]SDM2015-71
A study on Si surface flattening process by annealing Ar/H2ambient

Sohya Kudoh(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2015-10-29
[Paper #]SDM2015-72
Electrical Properties of MOSFETs Introducing Atomically Flat Gate Insulator/Silicon Interface

Tetsuya Goto(Tohoku Univ.),  Rihito Kuroda(Tohoku Univ.),  Tomoyuki Suwa(Tohoku Univ.),  Akinobu Teramoto(Tohoku Univ.),  Toshiki Obara(Tohoku Univ.),  Daiki Kimoto(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  Yutaka Kamata(LAPIS Semi. Miyagi),  Yuki Kumagai(LAPIS Semi. Miyagi),  Katsuhiko Shibusawa(LAPIS Semi. Miyagi),  

[Date]2015-10-29
[Paper #]SDM2015-74
Ultra-Low Temperature Flattening Technique of Silicon Surface Using Xe/H2 Plasma

Tomoyuki Suwa(Tohoku Univ.),  Akinobu Teramoto(Tohoku Univ.),  Tetsuya Goto(Tohoku Univ.),  Masaki Hirayama(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  Tadahiro Ohmi(Tohoku Univ.),  

[Date]2015-10-29
[Paper #]SDM2015-73
[Invited Talk] Radial line slot antenna microwave plasma source mediated conformal doping of non-planar silicon structures

Hirokazu Ueda(TEL TDC),  Peter Ventzek(TEL America),  Masahiro Oka(TEL TDC),  Yuuki Kobayashi(TEL TDC),  Yasuhiro Sugimoto(TEL TDC),  Satoru Kawakami(TEL TDC),  

[Date]2015-10-30
[Paper #]SDM2015-76
[Invited Talk] Materials and process technologies for large-area sheet-type display

Yoshihide Fujisaki(NHK),  

[Date]2015-10-30
[Paper #]SDM2015-79
A Study on the Device Characteristics of Pentacene-based OFET with HfO2 Gate Insulator

Yasutaka Maeda(Tokyo Tech.),  Yeyuan Liu(Tokyo Tech.),  Shun-ichiro Ohmi(Tokyo Tech.),  

[Date]2015-10-30
[Paper #]SDM2015-80
A Device Simulation Study on Tunneling and Diffusion Current Hybrid MOSFET

Kiichi Furukawa(Tohoku Univ.),  Akinobu Teramoto(Tohoku Univ.),  Rihito Kuroda(Tohoku Univ.),  Tomoyuki Suwa(Tohoku Univ.),  Keiichi Hashimoto(Tohoku Univ.),  Takashi Kojiri(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  

[Date]2015-10-30
[Paper #]SDM2015-77
Ferroelectric BiFeO3 Formation with Oxigen Radical Treatment

Fuminobu Imaizumi(Tohoku Univ.),  Tetsuya Goto(Tohoku Univ.),  Akinobu Teramoto(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  

[Date]2015-10-30
[Paper #]SDM2015-78
Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering

Hidekazu Ishii(Tohoku Univ),  Takahashi Kentarou(Sumitomo Osaka Cement),  Tetsuya Goto(Tohoku Univ),  Shigetoshi Sugawa(Tohoku Univ),  Tadahiro Ohmi(Tohoku Univ),  

[Date]2015-10-30
[Paper #]SDM2015-81
Investigation of stacked HfN gate insulator formed by ECR plasma sputtering

Nithi Atthi(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2015-10-30
[Paper #]SDM2015-82
Study of process temperature of Al2O3 atomic layer deposition using high accuracy process gasses supply controller

Hisaya Sugita(Tohoku Univ.),  Yasumasa Koda(Tohoku Univ.),  Tomoyuki Suwa(Tohoku Univ.),  Rihito Kuroda(Tohoku Univ.),  Tetsuya Goto(Tohoku Univ.),  Hidekazu Ishii(Tohoku Univ.),  Satoru Yamashita(Fujikin),  Akinobu Teramoto(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  Tadahiro Ohmi(Tohoku Univ.),  

[Date]2015-10-30
[Paper #]SDM2015-83