Electronics-Silicon Devices and Materials(Date:2009/10/22)

Presentation
表紙

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[Date]2009/10/22
[Paper #]
目次

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[Date]2009/10/22
[Paper #]
High current drivability transistors with optimized silicides for n^+- and p^+-Si

Yukihisa NAKAO,  Rihito KURODA,  Hiroaki TANAKA,  Akinobu TERAMOTO,  Shigetoshi SUGAWA,  Tadahiro OHMI,  

[Date]2009/10/22
[Paper #]SDM2009-117
A study on Improvement of Thermal Stability for PtSi Alloying with Hf Utilizing Two-Step Silicidation Process

Jun GAO,  Jumpei ISHIKAWA,  Shun-ichiro OHMI,  

[Date]2009/10/22
[Paper #]SDM2009-118
HfN/HfON Gate Stack formed by ECR Sputtering

Takahiro SANO,  Takato OHNISHI,  Shun-ichiro OHMI,  

[Date]2009/10/22
[Paper #]SDM2009-119
Silicon Wafer Thinning Technology for Three-Dimensional Integrated Circuit by Wet Etching

Kazuhiro YOSHIKAWA,  Tomotsugu OHASHI,  Tatsuro YOSHIDA,  Takenao NEMOTO,  Tadahiro OHMI,  

[Date]2009/10/22
[Paper #]SDM2009-120
Tribological Study for Low Shear Force CMP Process on Damascene Interconnects

Xun Gu,  Takenao Nemoto,  Yasa Adi Sampurno,  Jiang Cheng,  Sian Theng,  Akinobu Teramoto,  Ricardo Duyos Mateo,  Leonard Borucki,  Yun Zhuang,  Ara Philipossian,  Shigetoshi Sugawa,  Tadahiro Ohmi,  

[Date]2009/10/22
[Paper #]SDM2009-121
Current Voltage Characteristics of Si-MESFET on SOI Substrate

Toshiyuki ABE,  Yuichiro TANUSHI,  Shin-Ichiro KUROKI,  Koji KOTANI,  Takashi ITO,  

[Date]2009/10/22
[Paper #]SDM2009-122
Statistical Analysis of Random Telegraph Signal Using a Large-Scale Array TEG with a Long Time Measurement

Takafumi FUJISAWA,  Ken-ichi ABE,  Shunichi WATABE,  Naoto MIYAMOTO,  Akinobu TERAMOTO,  Shigetoshi SUGAWA,  Tadahiro OHMI,  

[Date]2009/10/22
[Paper #]SDM2009-123
An Analysis of Carrier Transfer in Conjugated Polymers by Luminescence Computational Chemistry

Itaru YAMASHITA,  Kazumi SERIZAWA,  Hiroaki ONUMA,  Ai SUZUKI,  Ryuji MIURA,  Hideyuki TSUBOI,  Nozomu HATAKEYAMA,  Akira ENDOU,  Hiromitsu TAKABA,  Momoji KUBO,  Akira MIYAMOTO,  

[Date]2009/10/22
[Paper #]SDM2009-124
Computational Simulation for High Performance Protecting Layer of Plasma Displays

Kazumi SERIZAWA,  Hiroaki ONUMA,  Hiromi KIKUCHI,  Kazuma SUESADA,  Masaki KITAGAKI,  Itaru YAMASHITA,  Ai SUZUKI,  Hideyuki TSUBOI,  Nozomu HATAKEYAMA,  Akira ENDOU,  Hiromitsu TAKABA,  Momoji KUBO,  Hiroshi KAJIYAMA,  Akira MIYAMATO,  

[Date]2009/10/22
[Paper #]SDM2009-125
Prediction of emission peak wavelength of Eu^<2+>-doped phosphors using quantum chemistry and QSPR method

Hiroaki ONUMA,  Itaru YAMASHITA,  Kazumi SERIZAWA,  Ai SUZUKI,  Hideyuki TSUBOI,  Nozomu HATAKEYAMA,  Akira ENDOU,  Hiromitsu TAKABA,  Momoji KUBO,  Akira MIYAMATO,  

[Date]2009/10/22
[Paper #]SDM2009-126
Investigation of characteristics of pentacene-based MOSFETs structures

Y-U Song,  S. Ohmi,  H. Ishiwara,  

[Date]2009/10/22
[Paper #]SDM2009-127
Crystallization of Amorphous Silicon Film on Glass Substrate by Heated Gas Beam Annealing

Yuichiro TANUSHI,  Yosuke KAWANO,  Shin-Ichiro KUROKI,  Koji KOTANI,  Naomi MURA,  Kimihisa YAMAKAMI,  Yuji FURUMURA,  Takashi ITO,  

[Date]2009/10/22
[Paper #]SDM2009-128
Recovery from Reactive Ion Etching Damage in Gate Dielectrics

Nobuhito KAWADA,  Satoshi NAGASHIMA,  Toru ICHIKAWA,  Hiroshi AKAHORI,  

[Date]2009/10/22
[Paper #]SDM2009-129
Low frequency noise in Si(100) and Si(110) p-channel MOSFETs

Philippe GAUBERT,  Akinobu TERAMOTO,  Tadahiro OHMI,  

[Date]2009/10/22
[Paper #]SDM2009-130
A study on improvement of electrical characteristics for low temperature SiO_2 film

Hidenobu NAGASHIMA,  Hiroshi AKAHORI,  

[Date]2009/10/22
[Paper #]SDM2009-131
Electrochemical Etching Processes of Semiconductors

Kingo ITAYA,  Shinichirou KOBAYASHI,  Rui Wen,  Takatoshi MINATO,  

[Date]2009/10/22
[Paper #]SDM2009-132
Oxy-nitridation Simulation of Silicon Surface Using Automated System of Ultra-Accelerated Quantum Chemical Molecular Dynamics Method

Hideyuki TSUBOI,  Ai SUZUKI,  Nozomu HATAKEYAMA,  Akira ENDOU,  Hiromitsu TAKABA,  Momoji KUBO,  Akira MIYAMOTO,  

[Date]2009/10/22
[Paper #]SDM2009-133
Study on compositional transition layers at SiO_2/Si interface formed by radical oxidation

Tomoyuki SUWA,  Akinobu TERAMOTO,  Tadahiro OHMI,  Takeo HATTORI,  Toyohiko KINOSHITA,  Takayuki MURO,  Yukako KATO,  

[Date]2009/10/22
[Paper #]SDM2009-134
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