Electronics-Silicon Devices and Materials(Date:2004/06/15)

Presentation
表紙

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[Date]2004/6/15
[Paper #]
目次

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[Date]2004/6/15
[Paper #]
Correlated diffusion of B and Si in thermally grown SiO_2

Masashi UEMATSU,  Hiroyuki KAGESHIMA,  Yasuo TAKAHASHI,  Shigeto FUKATSU,  Kenji SHIRAISHI,  

[Date]2004/6/15
[Paper #]SDM2004-47
XPS study of radical intrided silicon oxide film

Kazumasa Kawase,  Hiroshi Umeda,  Masao Inoue,  Shinpei Tsujikawa,  Yasuhiko Akamatsu,  Akinobu Teramoto,  Tadahiro Ohmi,  

[Date]2004/6/15
[Paper #]SDM2004-48
Trap Level Generation by Nitrogen at the Si/SiO_2 Interface

Takahiro YAMASAKI,  Chioko KANETA,  

[Date]2004/6/15
[Paper #]SDM2004-49
Scalability of SiON gate dielectric in terms of NBTI

Shimpei Tsujikawa,  Yasuhiko Akamatsu,  Hiroshi Umeda,  Jiro Yugami,  

[Date]2004/6/15
[Paper #]SDM2004-50
Negative Bias Temperature Instability (NBTI) in Ultra-thin Gate Oxide

Yuichiro Mitani,  Hideki Satake,  

[Date]2004/6/15
[Paper #]SDM2004-51
Analysis of Local Leakage Current in Gate Dielectric by Conductive Atomic Force Microscopy

Akiyoshi SEKO,  Yukihiko WATANABE,  Hiroki KONDO,  Akira SAKAI,  Shigeaki ZAIMA,  Yukio YASUDA,  

[Date]2004/6/15
[Paper #]SDM2004-52
Effect of Soft Breakdown in Ultrathin Gate Oxides on Channel Current

Hiroaki HOSOI,  Yoshinari KAMAKURA,  Kenji TANIGUTI,  

[Date]2004/6/15
[Paper #]SDM2004-53
Characterization of Defects in HfO_2 by ESR

Takeshi KANASHIMA,  Koji IKEDA,  Taizo TADA,  Masayuki SOHGAWA,  Masanori OKUYAMA,  

[Date]2004/6/15
[Paper #]SDM2004-54
Stucy on Carrier Trapping Phenomena in HfAlOx Film by using XPS Time-Dependent Measurement

K. HIROSE,  M. YAMAWAKI,  K. TORII,  T. KAWAHARA,  S. KAWASHIRI,  T. HATTORI,  

[Date]2004/6/15
[Paper #]SDM2004-55
Observation of Leakage Spots in HfO_2/SiO_2 Stacked Structures by UHV-C-AFM

Kentaro KYUNO,  Koji KITA,  Akira TORIUMI,  

[Date]2004/6/15
[Paper #]SDM2004-56
Transient Electrical Characteristics in MOS Capacitor with HfAlO_x Stacked Gate Dielectrics

Keiichi Higuchi,  Masakazu Goto,  Kazuyoshi Torii,  Akira Uedono,  Ryu Hasunuma,  Kikuo Yamabe,  

[Date]2004/6/15
[Paper #]SDM2004-57
Dielectric breakdown Characteristics of poly-Si/HfAlOx/SiON gate stack

Kazuyoshi TORII,  Hiroshi OHJI,  Akiyoshi MUTOH,  Tkaaki KAWAHARA,  Riichiro MITSUHASHI,  Atsushi HORIUCHI,  Seiichi MIYAZAKI,  Hiroshi KITAJIMA,  

[Date]2004/6/15
[Paper #]SDM2004-58
Defect generation and dielectric breakdown mechanism of HfSiO(N)

Izumi Hirano,  Takeshi Yamaguchi,  Yuichiro Mitani,  Katsuyuki Sekine,  Mariko Takayanagi,  Kazuhiro Eguchi,  Yoshitaka Tsunashima,  Hideki Satake,  

[Date]2004/6/15
[Paper #]SDM2004-59
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[Date]2004/6/15
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[Date]2004/6/15
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