Electronics-Silicon Devices and Materials(Date:1998/11/20)

Presentation
表紙

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[Date]1998/11/20
[Paper #]
目次

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[Date]1998/11/20
[Paper #]
Currenr status and future prospect of ArF excimer laser lithography

Tohru Ogawa,  Takahiro Matsuo,  Junji Miyazaki,  Hiroaki Morimoto,  

[Date]1998/11/20
[Paper #]SDM98-160
Mask fabrication techniques using a Ta_3Ge X-ray absorber

Yoshihisa Iba,  Fumiaki Kumasaka,  Masaki Yamabe,  

[Date]1998/11/20
[Paper #]SDM98-161
Mask bias requirement for e-beam block exposure lithography

Kimitoshi Takahashi,  Hiroyuki Kanata,  Yasuo Nara,  

[Date]1998/11/20
[Paper #]SDM98-162
Measurement Technique of Coma Aberration using Halftone Phase-Shifting Mask

Katsuya Hayano,  Norio Hasegawa,  Akira Imai,  Naoko Asai,  

[Date]1998/11/20
[Paper #]SDM98-163
Simple Method for Resist CD Prediction

Shuji Nakao,  Hiroshi Matsubara,  Atsumi Yamaguchi,  Jyunjirou Sakai,  Akihiro Nakae,  Kouichirou Tsujita,  Wataru Wakamiya,  

[Date]1998/11/20
[Paper #]SDM98-164
A Chemical-Amplification Positive-Resist Design for 0.18-μm Reticle Fabrication using the High-Acceleration-Voltage (50-kV) Electron Beam System (HL-800M)

Tadashi Arai,  Toshio Sakamizu,  Takashi Soga,  Hidetoshi Satoh,  Kohji Katoh,  Hiroshi Shiraishi,  

[Date]1998/11/20
[Paper #]SDM98-165
Novel inspection method for detecting critical dimension-and transmission defects on photomasks in quarter-micron lithography

Kyoji YAMASHITA,  Shinnji YAMAGUCHI,  Kazuhiro NAKASHIMA,  

[Date]1998/11/20
[Paper #]SDM98-166
[OTHERS]

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[Date]1998/11/20
[Paper #]