Electronics-Silicon Devices and Materials(Date:1997/08/26)

Presentation
表紙

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[Date]1997/8/26
[Paper #]
目次

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[Date]1997/8/26
[Paper #]
Thermal Nitridation of the Si Surface Using NH_3 at Low Temperature

Takeshi WATANABE,  Masao SAKURABA,  Takashi MATSUURA,  Junichi MUROTA,  

[Date]1997/8/26
[Paper #]SDM97-92
Low-Temperature Reaction of CH_4 on Si(100)

Atsushi IZENA,  Masao SAKURABA,  Takashi MATSUURA,  Junichi MUROTA,  

[Date]1997/8/26
[Paper #]SDM97-93
Effect of UV light irradiation on passivation of mobile ions in MOS devices

Manabu Itsumi,  Katsuyuki Machida,  Jun-ichi Takahashi,  Hideo Akiya,  Satoshi Nakayama,  Hideo Yoshida,  

[Date]1997/8/26
[Paper #]SDM97-94
Formation of Low-Leakage-Current and Low-Contact-resistance Tantalum Silicided Junctions by Low-Temperature Process

Yoshiyuki Taniguchi,  Kazuhide Ino,  Tadahiro Ohmi,  

[Date]1997/8/26
[Paper #]SDM97-95
Reduction of Parasitic Resistances in FSAM-MOSFET

M. Yokoyama,  R. Tajima,  H. Matsuhashi,  K. Masu,  K. Tsubouchi,  

[Date]1997/8/26
[Paper #]SDM97-96
Optimized redundancy technology based on yield estimation of peripheral circuit for gigabit DRAMs

Shigeyoshi WATANABE,  

[Date]1997/8/26
[Paper #]SDM97-97
A study of memory cell for high density DRAM

Yoshitaka Tadaki,  Toshihiro Sekiguchi,  Jun Murata,  Masaya Muranaka,  Masashi Miura,  Kazuya Makabe,  Toshiyuki Kaeriyama,  Songsu Cho,  Katsuo Yuhara,  

[Date]1997/8/26
[Paper #]SDM97-98
Development of CZ crystal growth having Super large diameter.

H. Yamagishi,  M. Kuramoto,  Y. Shiraishi,  N. Machida,  K. Takano,  K. Takase,  I. Iida,  J. Matsubara,  

[Date]1997/8/26
[Paper #]SDM97-99
Higher-Order Overlay Correction Method for Hybrid Lithography between EB Direct Writing and Optical Lithography

K. Tokunaga,  K. Nakajima,  Y. Kojima,  N. Onoda,  H. Nozue,  

[Date]1997/8/26
[Paper #]SDM97-100
Highly controlled fabrication process of Si nano structures using anisotropic etching

Kenichi SAITO,  Hiroki ISHIKURO,  Toshikazu MUKAIYAMA,  Toshiro HIRAMOTO,  

[Date]1997/8/26
[Paper #]SDM97-101
Inductively Coupled Plasma for Highly Selective SiO2 Etching

Shigenori Hayashi,  Michinari Yamanaka,  Masafumi Kubota,  

[Date]1997/8/26
[Paper #]SDM97-102
High Density and High Uniformity Plasma Etcher With Parallel Magnetic Field

Yusuke Hirayama,  Masaki Hirayama,  Haruyuki Takano,  Tadahiro Ohmi,  

[Date]1997/8/26
[Paper #]SDM97-103
[OTHERS]

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[Date]1997/8/26
[Paper #]