Electronics-Silicon Devices and Materials(Date:1997/04/24)

Presentation
表紙

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[Date]1997/4/24
[Paper #]
目次

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[Date]1997/4/24
[Paper #]
Fabrication of 30-nm-gate-length EJ-MOSFETs

Hisao Kawaura,  Toshitsugu Sakamoto,  Toshio Baba,  Yukinori Ochiai,  Jun'ichi Fujita,  Shinji Matsui,  Jun'ichi Sone,  

[Date]1997/4/24
[Paper #]ED97-1,SDM97-1
Cleaning technology inside the sub-micron contact hole after dry etching

M. Miyamoto,  S. Ishida,  H. Gotoh,  T. Watari,  K. Mizobuchi,  

[Date]1997/4/24
[Paper #]ED97-2,SDM97-2
A novel method for estimating neutral trap density generated during Fowler-Nordheim stress and Substrate Hot Hole stress in SiO2 films

K. Sakakibara,  N. Ajika,  H. Miyoshi,  

[Date]1997/4/24
[Paper #]ED97-3,SDM97-3
Fabrication of Self-Assembled InAs Dots and Its Application to Single Electron Devices

Kanji Yoh,  

[Date]1997/4/24
[Paper #]ED97-4,SDM97-4
Tunneling-electron luminescence microscopy of quantum structures using tip collection

T. Murashita,  K. Tateno,  

[Date]1997/4/24
[Paper #]ED97-5,SDM97-5
Field-Effect Quantum Devices with Si/CdF_2 Quantum-Well Structure on Si Substrate

W. Saitoh,  M. Tsutsui,  Y. Aoki,  K. Yamazaki,  J. Nishiyama,  M. Watanabe,  M. Asada,  

[Date]1997/4/24
[Paper #]ED97-6,SDM97-6
Fabrication of Site-Controlled Quantum Dot Structures on the Epitaxial CaF_2 Film

Koji KAWASAKI,  Kazuya UEJIMA,  Jun TAKESHITA,  Kazuo TSUTSUI,  

[Date]1997/4/24
[Paper #]ED97-7,SDM97-7
Quantum Levels in InAs Self-Assembled Quantum Dots Estimated by Capacitance-Voltage Measurement

N. Horiguchi,  T. Futatsugi,  Y. Nakata,  N. Yokoyama,  

[Date]1997/4/24
[Paper #]ED97-8,SDM97-8
Si-δ doping on OMVPE grown InP surface with monolayer steps

Michihiko SUHARA,  Hidetaka HONJI,  Hifumi NAKAMURA,  Yasuyuki MIYAMOTO,  Kazuhito Furuya,  

[Date]1997/4/24
[Paper #]ED97-9,SDM97-9
Optical Characterization of the Optical Cavity Consisting of Si-doped SiO_2 Multilayer

Daisuke Kenmochi,  Seiichi Sato,  Hiroshi Ono,  Shinji Nozaki,  Hiroshi Morisaki,  

[Date]1997/4/24
[Paper #]ED97-10,SDM97-10
Surface analysis of native oxide etched by anhydrous HF

Yutaka Nakazawa,  Yoji Saito,  

[Date]1997/4/24
[Paper #]ED97-11,SDM97-11
Atomic level observation of initial stage oxygen adsorption of the Si(100)-2x1-H

H. Kajiyama,  T. Hashizume,  S. Heike,  Y. Wada,  

[Date]1997/4/24
[Paper #]ED97-12,SDM97-12
[OTHERS]

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[Date]1997/4/24
[Paper #]