Electronics-Silicon Devices and Materials(Date:1996/11/01)

Presentation
表紙

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[Date]1996/11/1
[Paper #]
目次

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[Date]1996/11/1
[Paper #]
Crystalline Ge film deposition by remote plasma CVD using tetraethylgermanium

Toru Aoki,  Takuya Ogishima,  Yoichiro Nakanishi,  Yoshinori Hatanaka,  

[Date]1996/11/1
[Paper #]SDM96-107
ATOMIC HYDROGEN-INDUCED CHEMICAL VAPOR DEPOSITION OF a-Si:C:H FILMS USING ALKYLSILANES AS A SINGLE-SOURCE PRECURSORS

Aleksander M. Wrobel,  Yoshinori Hatanaka,  Sunil Wickramanayaka,  Yoichiro Nakanishi,  

[Date]1996/11/1
[Paper #]SDM96-108
In-situ Measurement of Negative and Positive Ions in CF4 Magnetized Plasma By Use of a Cyclotron Resonance Mass Spectrometer

Ryoichi Kawai,  Tetsu Mieno,  

[Date]1996/11/1
[Paper #]SDM96-109
MODELLING OF SURFACE WAVE SUSTAINED PLASMA SOURCE

Igor Odrobina,  Masashi Kando,  

[Date]1996/11/1
[Paper #]SDM96-110
X-ray source in keV range by abnormal glow discharge

Ken-ichi Sato,  Masayuki Fukao,  

[Date]1996/11/1
[Paper #]SDM96-111
High Pressure Surface Wave Discharge in Xenon

J. Kudela,  I. Odrobina,  M. Kando,  

[Date]1996/11/1
[Paper #]SDM96-112
Production and Control of Large-Diameter Plasmas for Materials Processing

Noriyoshi Sato,  

[Date]1996/11/1
[Paper #]SDM96-113
Plasma characteristics of the UHF plasma source and its application for dry etching processes

Y. Nakagawa,  K. Takagi,  T. Koide,  E. Wani,  H. Nogami,  S. Samukawa,  T. Tsukada,  

[Date]1996/11/1
[Paper #]SDM96-114
Low Temperature growth of Epitaxial Si by Remote Plasma-enhanced CVD

Ashtosh Ganjoo,  Teruaki Nishida,  In-Ho Bae,  Akira Yoshida,  

[Date]1996/11/1
[Paper #]SDM96-115
Theoretical Studies on Defect Energy Levels in Nitride Semiconductors

Akira Yoshida,  Yuji Matsuda,  

[Date]1996/11/1
[Paper #]SDM96-116
Formation of Electrical Conductive Hard-Carbon (DLC) Films Using i-C_4H_<10>/N_2 Supermagnetron Plasma

Jun TAKAHASHI,  Takuya HANDO,  Haruhisa KINOSHITA,  

[Date]1996/11/1
[Paper #]SDM96-117
Deposition of SiC Thin Films on Polymer Surface as a Hard Coating by ECR Plasma

K. Sano,  H. Tamamaki,  M. Nomura,  Y. Nakanishi,  Y. Hatanaka,  

[Date]1996/11/1
[Paper #]SDM96-118
[OTHERS]

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[Date]1996/11/1
[Paper #]