Electronics-Silicon Devices and Materials(Date:1995/10/19)

Presentation
表紙

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[Date]1995/10/19
[Paper #]
目次

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[Date]1995/10/19
[Paper #]
Si-OH Groups on SiNx Substrates and Their Effects on pattern profile deformation in Chemical Amplification Resists

Ryoko Yamanaka,  Takashi Hattori,  Toshiyuki Mine,  Toshihiko Tanaka,  

[Date]1995/10/19
[Paper #]SDM95-139
Optical Proximity Correction based on Aerial Image Simulation

Akihifo Nakae,  Kazuya Kamon,  Tetsuro Hanawa,  Shuji Nakao,  Yasuji Matsui,  Kouichi Moriizumi,  Hiroshi Mitsuda,  Yasuto Myoui,  

[Date]1995/10/19
[Paper #]SDM95-140
A New Spatial Frequency Doubling Method (FREDIS) for Sub-O.15-μm Optical Lithography

Akihiro Otaka,  Yoshio Kawai,  Akinobu Tanaka,  Tadahito Matsuda,  

[Date]1995/10/19
[Paper #]SDM95-141
Topography Effect Evaluation in KrF Excimer Lithography

Hiroshi Yoshino,  Toshiro Itani,  Shuichi Hashimoto,  Mitsuharu Yamana,  Norihiko Samoto,  Kunihiko Kasama,  

[Date]1995/10/19
[Paper #]SDM95-142
Error budget of phase shift and transmittance for Deep UV half-tone phase shifting masks

Masamitsu Itoh,  Suigen Kyoh,  Hideaki Sakurai,  Iwao Higashikawa,  

[Date]1995/10/19
[Paper #]SDM95-143
Ta/SiC X-Ray Mask

Hajime Aoyama,  Fumiaki Kumasaka,  Yoshihisa Iba,  Masaki Yamabe,  

[Date]1995/10/19
[Paper #]SDM95-144
[OTHERS]

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[Date]1995/10/19
[Paper #]