Electronics-Silicon Devices and Materials(Date:1995/08/17)

Presentation
表紙

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[Date]1995/8/17
[Paper #]
目次

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[Date]1995/8/17
[Paper #]
IMPROVED WET CLEANING PROCESSING USING ELECTROLYTIC IONIZED WATER FOR TFT-LCD MANUFACTURING

Takashi Imaoka,  Senri Ojima,  Kazuki Kubo,  Hiroshi Morita,  Tadahiro Ohmi,  Ken-ichi Mitsumori,  Eui-yeol Oh,  Yasuhiko Kasama,  Michio Yoshizawa,  Koji Yamanaka,  Masayuki Kato,  Masayuki Toda,  

[Date]1995/8/17
[Paper #]
ACTIVATED RADICAL WET CLEANING SYSTEM FOR ULTRA CLEAN SURFACE

Fumitomo Kunimoto,  Takashi Imaoka,  Yasuhiko Kasama,  Tadahiro Ohmi,  Masayuki Kato,  Masayuki Toda,  Ken-ichi Mitsumori,  Eui-yeol Oh,  Koji Yamanaka,  

[Date]1995/8/17
[Paper #]
Key and Powerful Technology for Semiconductor Production

Satoru Kawazu,  

[Date]1995/8/17
[Paper #]
Identification and Removal of Organic Contamination on Wafer Surfaces

Koichiro Saga,  Sakuo Koyata,  Takeshi Hattori,  

[Date]1995/8/17
[Paper #]
Measuement and behavior of moisture and siloxane in silane gas

Atsushi Ohki,  Tadahiro Ohmi,  

[Date]1995/8/17
[Paper #]
HIGH PERFORMANCE GAS PANEL SYSTEM FOR SEMICONDUCTOR MANUFACTURING WITH EFFECT TO MAINTENANCEBILITY

Nobukazu Ikeda,  Tsutomu Shinohara,  Michio Yamaji,  Tadahiro Ohmi,  

[Date]1995/8/17
[Paper #]
Effect of Cl2 Addition to O2 Plasma on RuO2 Etching : Quarter micron size dry etching of RuO2 thin films for Gb DRAMs

Ken Tokashiki,  Kiyoyuki Sato,  Hidenobu Miyamoto,  

[Date]1995/8/17
[Paper #]
Improvement of Dry Etching Resistance of Photoresist by Means of Ion Implantation

Kiyoshi Shibata,  Keiichi Ueda,  Kazunobu Mameno,  

[Date]1995/8/17
[Paper #]
Profile-Control in Poly-Silicon Gate Etching Based on Topography Simulation

Kenji Harafuji,  Mitsuhiro Ohkuni,  Masafumi Kubota,  Hideo Nakagawa,  Akio Misaka,  

[Date]1995/8/17
[Paper #]
Si Surface Damage Caused by Contact Hole Etching

Norihiro Ikeda,  Yasunori Inoue,  Tomio Yamashita,  Shoji Sudo,  Kaoru Taketa,  Yoshinari Ichihashi,  Kazunobu Mameno,  

[Date]1995/8/17
[Paper #]
SiO_2 Etching Characteristics with Induction Coupled Plasma

Masayuki Sato,  Tadahiro Ohmi,  

[Date]1995/8/17
[Paper #]
Study of changes in etching characteristics with a lapse of time in a fluorocarbon ECR plasma

Yasuhiro Miyakawa,  Takayuki Matsui,  Jun Kanamori,  

[Date]1995/8/17
[Paper #]
[OTHERS]

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[Date]1995/8/17
[Paper #]