Electronics-Silicon Devices and Materials(Date:1994/10/20)

Presentation
表紙

,  

[Date]1994/10/20
[Paper #]
目次

,  

[Date]1994/10/20
[Paper #]
Deposition of a-SiC:H films from carbosilanes in remote plasma system

Sunil Wickraman-ayaka,  Aleksander M. Wrobel,  Yoichiro Nakanishi,  Yoshinori Hatanaka,  

[Date]1994/10/20
[Paper #]SDM94-111
Film Formation Due to DC Plasma CVD Using Hexsamechildisilane.

Hidenori Yamanashi,  Toshiaki Kanno,  Akihiro Etoh,  Masashi Kando,  

[Date]1994/10/20
[Paper #]SDM94-112
Low-temperature growth of Si thin films by remote plasma-enhanced CVD

Kazutoshi Utsumi,  Ashtosh Ganjoo,  Akira Yoshida,  

[Date]1994/10/20
[Paper #]SDM94-113
Etch-Profile Control of Quarter-Micron Resist Pattern Using O_2 Supermagnetron Plasma Added with N_2 Gas

Haruhisa Kinoshita,  Atsushi Yamauchi,  Mikio Sawai,  

[Date]1994/10/20
[Paper #]SDM94-114
Characteristics of Arc-like Microwave Discharge and Its Application to Decomposition of Scrapped Plastics

Masataka Kajihara,  Masashi Kando,  

[Date]1994/10/20
[Paper #]SDM94-115
Generation of low temperature plasma at atmospheric pressure and its application to etching and ashing processes in open air

Kiyoto Inomata,  Hyun-Kuon Ha,  Bong-ju Lee,  Hideomi Koinuma,  

[Date]1994/10/20
[Paper #]SDM94-116
A uniform dense plasma with large area produced by electron cyclotron heating in a linear multipole field

Akihiro Watanabe,  Masayuki Fukao,  

[Date]1994/10/20
[Paper #]SDM94-117
Measurement of radical densities in electron cyclotron resonance SiH_4/H_2 plasma processing

Yasuo Yamamoto,  Masaru Hori,  Mineo Hiramatsu,  Toshio Goto,  

[Date]1994/10/20
[Paper #]SDM94-118
Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon

Mei Zhang,  Yoshikazu Nakayama,  

[Date]1994/10/20
[Paper #]SDM94-119
Dependence of Aromalous Reflection Spectra Amorpheus Media on the Polarization of Lighf

Shigeki Takeuchi,  Yukihiro Yamada,  Shoji Nitta,  Shuichi Nonomura,  

[Date]1994/10/20
[Paper #]SDM94-120
is-situ Diagnostics of Plasma Process by Polarized Light Reflection Measurement

Nobuo Naito,  Masashi Kawasaki,  Hideomi Koinuma,  

[Date]1994/10/20
[Paper #]SDM94-121
In situ obserration of the growth of polysilicon thin film with spectroscoplc ellipsometry

Tetsuya Akasaka,  Isamu Shimizu,  

[Date]1994/10/20
[Paper #]SDM94-122
S In Situ Ellipsometric Monitoring of Poly-Si Thin Film Grown by RF Plasma of SiF_4/SiH_4/H_2 Gas Mixture

Tatsuru Shirafuji,  Kunihide Tachibana,  Tatsuo Morita,  

[Date]1994/10/20
[Paper #]SDM94-123
Empirical Dielectric Funtion Useful for Spectroellipsometry of Amorphous Materials

Yuuichi Kaneko,  Mitsuru Aoyama,  Tomuo Yamaguchi,  

[Date]1994/10/20
[Paper #]SDM94-124
[OTHERS]

,  

[Date]1994/10/20
[Paper #]