Electronics-Silicon Devices and Materials(Date:1994/08/18)

Presentation
表紙

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[Date]1994/8/18
[Paper #]
目次

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[Date]1994/8/18
[Paper #]
Simultaneous Temperature Measurement of the Wafer in Chemical Mechanical Polishing in the Dielectric

Fumitoshi Sugimoto,  Hiromasa Hoko,  Yoshihiro Arimoto,  Takashi Ito,  

[Date]1994/8/18
[Paper #]SDM94-76
Substrate Orientation Dependence of Self-Limited Atomic-Layer- Etching of Si

Koji Suzue,  Takashi Matsuura,  Junichi Murota,  Yasuji Sawada,  Tadahiro Ohmi,  

[Date]1994/8/18
[Paper #]SDM94-77
New Delineation of Process-Induced Micro-Defects using Anodic Oxidation

Shinji Fujii,  Genshu Fuse,  Morio Inoue,  

[Date]1994/8/18
[Paper #]SDM94-78
Single Electron Device from view point of CCD Researches

Yoshiyuki Matsunaga,  Fujio Masuoka,  

[Date]1994/8/18
[Paper #]SDM94-79
Selective Al CVD for ULSI Interconnection

Kazuo Tsubouchi,  Kazuya Masu,  

[Date]1994/8/18
[Paper #]SDM94-80
Silicon Surface Cleaning by Oxidation with ECR Oxygen Plasma after Contact Hole Dry Etching

Kazuhito Sakuma,  Katsuyuki Machida,  Yoshiyuki Sato,  Kazuyoshi Kamoshida,  Kazuo Imai,  Eisuke Arai,  

[Date]1994/8/18
[Paper #]SDM94-81
ULTRA-LOW-TEMPERATURE GROWTH OF GATE OXIDE FILMS BY LOW-ENERGY ION- ASSISTED OXIDATION

Jinzo Watanabe,  Yasuaki Kawai,  Nobuhiro Konishi,  Tadahiro Ohmi,  

[Date]1994/8/18
[Paper #]SDM94-82
[OTHERS]

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[Date]1994/8/18
[Paper #]