Electronics-Silicon Devices and Materials(Date:1994/08/17)

Presentation
表紙

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[Date]1994/8/17
[Paper #]
目次

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[Date]1994/8/17
[Paper #]
Issues of wet cleaning in ULSI manufacturing

Tsuneo Ajioka,  Mayumi Shibata,  Sato Waragai,  Kouichi Ohiwa,  Hidetsugu Uchida,  

[Date]1994/8/17
[Paper #]SDM94-69
INFLUENCES OF SURFACTANT IN ACID AND ALKALI SOLUTIONS TO SILICON SURFACES

Ichiro Oki,  Yoshihisa Nogami,  Atsushi Kagisawa,  

[Date]1994/8/17
[Paper #]SDM94-70
Cleaning of Carbon Contamination Free Sillicon Wafer Surface and Carrying Technology of Sillicon Wafer

Senri Ojima,  Masashi Nose,  Kazuki Kubo,  Norikuni Yabumoto,  Tadahiro Ohmi,  

[Date]1994/8/17
[Paper #]SDM94-71
Mechanism of CVD Oxide Film Etching Using Buffered Hydrofluoric Acid

Yasuo Kunii,  Satoshi Nakayama,  Masahiko Maeda,  

[Date]1994/8/17
[Paper #]SDM94-72
Measurement technique of adsorbed moisture concentration on solid surface

Hiroto Izumi,  Shinji Miyoshi,  Tadahiro Ohmi,  

[Date]1994/8/17
[Paper #]SDM94-73
Design Optimization of Vacuum Pumping System for High Integrity Reduced-Gas-Pressure Processes.

Nobuhiro Konishi,  Tadashi Shibata,  Tadahiro Ohmi,  

[Date]1994/8/17
[Paper #]SDM94-74
The Relationship between Metalic Inpurities in SC-1 Solution and Particles on Wafer Surface.

Norio Ishikawa,  Kiyoto Mori,  

[Date]1994/8/17
[Paper #]SDM94-75
[OTHERS]

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[Date]1994/8/17
[Paper #]