Electronics-Silicon Devices and Materials(Date:1994/04/21)

Presentation
表紙

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[Date]1994/4/21
[Paper #]
目次

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[Date]1994/4/21
[Paper #]
[CATALOG]

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[Date]1994/4/21
[Paper #]
TDS study of the oxidation of Si(111)surface

Fuminori Ito,  Kouji Watanabe,  Hiroyuki Hirayama,  

[Date]1994/4/21
[Paper #]SDM94-1
Initial Stage of Oxidation of Hydrogen-Terminated Si(111)through Preoxide

Hiroaki Sekikawa,  Kazuaki Ohishi,  Hiroshi Nohira,  Takeo Hatori,  

[Date]1994/4/21
[Paper #]SDM94-2
Initial stage of Oxidation of Hydrogen-Terminated Si(100)-2×1 Surf ace and Its Interface Structure

Takeshi Aiba,  Ken Yamauchi,  Yuichi Shimuzu,  Naoto Tate,  Masatake Katayama,  Takeo Hatori,  

[Date]1994/4/21
[Paper #]SDM94-3
Study on silicide formation process in Ta/Si systems

Taichi Nakanishi,  Atsushi Noya,  Mayumi Takeyama,  Katsutaka Sasaki,  

[Date]1994/4/21
[Paper #]SDM94-4
Preparation of tungsten films by plasma excited hydrogen

Teruo Takagi,  Yoshiaki Inaba,  Takayuki Kohno,  Youji Saito,  

[Date]1994/4/21
[Paper #]SDM94-5
Accelerated desorption of fluorine adsorbates on silicon surface induced by atomic hydrogen

Yoji Saito,  Minoru Okada,  

[Date]1994/4/21
[Paper #]SDM94-6
Study on the Suppression Mechanism of the Corrosion with O_2+H_2O Down Flow by means of TDS

Hidehiro Kojiri,  Jiro Matsuo,  Koji Watanabe,  Moritaka Nakamura,  

[Date]1994/4/21
[Paper #]SDM94-7
Mecharism of Metallic Contamination onto Si Surfaces in Wet Chemical Processing and It′s Prevention.

Hitoshi Morinaga,  Makoto Suyama,  Masashi Nose,  Tadahiro Ohmi,  

[Date]1994/4/21
[Paper #]SDM94-8
Cleaning Technology of Silicon Wafer Suaface without Organic Contamination by Dynamic Cleaning System with Ozonized Ultropure Water

Naomichi Yonekawa,  Shinichi Yasui,  Tadahiro Ohmi,  

[Date]1994/4/21
[Paper #]SDM94-9
The Formation of Terraces and Steps on Si(100) Surfaces and the Change of these Surfaces during Wet Processing

Steven Verhaverbeke,  Rochdi Messousi,  Takishi Futatsuki,  Tadahiro Ohmi,  

[Date]1994/4/21
[Paper #]SDM94-10
Relaxation phenomena of holes trapped in the oxide layar of a metal-oxide-semiconductor Structure

D.M.Khosru Quazi,  Kenji Taniguchi,  Chihiro Hamaguchi,  

[Date]1994/4/21
[Paper #]SDM94-11
Control of Native Oxides on Deep Submicron Contact-Hole-Bottoms Si Surfaces

Masaharu Nakamori,  Nahomi Aoto,  Nobuyuki Ikarashi,  Kouichi Ishida,  Yuden Teraoka,  Iwao Nishiyama,  

[Date]1994/4/21
[Paper #]SDM94-12
Translational-Energy-Induced Etching of Si(100) by Hyperthermal Energy Cl_2 Beams

Yuden Teraoka,  Iwao Nishiyama,  

[Date]1994/4/21
[Paper #]SDM94-13
Spin Centers in LPCVD-Si_3N_4 Thin Films -Study of Charge Trap Centers-

Yoshiaki Kamigaki,  Ken'etsu Yokogawa,  Hisayuki Kato,  Shin'ichi Minami,  

[Date]1994/4/21
[Paper #]SDM94-14
Morphology of the Si/SiO_2 interface of a SIMOX wafer

Toshihiko Ishiyama,  Masao Nagase,  Katsumi Murase,  

[Date]1994/4/21
[Paper #]SDM94-15
[OTHERS]

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[Date]1994/4/21
[Paper #]