Electronics-Silicon Devices and Materials(Date:1993/10/28)

Presentation
表紙

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[Date]1993/10/28
[Paper #]
目次

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[Date]1993/10/28
[Paper #]
Practical resolution improvement in oblique illumination lithography

Emi Tamechika,  Toshiyuki Horiuchi,  Katsuhiro Harada,  

[Date]1993/10/28
[Paper #]SDM93-110
Hole pattern fabrication using halftone phase-shifting masks

Akihiro Otaka,  Yoshio Kawai,  Tadahito Matsuda,  

[Date]1993/10/28
[Paper #]SDM93-111
Primary Processes in E-Beam and Laser Lithographies for Phase- Shift Mask Manufacturing.

Masaaki Kurihara,  

[Date]1993/10/28
[Paper #]SDM93-112
Evaluation and application of Chemically Amplified e-beam positive resist PSR

Hidenori Yamaguchi,  Toshio Sakamizu,  Fumio Murai,  Hiroshi Shiraishi,  Shinji Okazaki,  Hajime Hayakawa,  Keiko Hasegawa,  

[Date]1993/10/28
[Paper #]SDM93-113
Study for practical resolution of single layer chemically amplified resist in KrF excimer laser lithography

Kazuhiro Yamashita,  Akiko Katsuyama,  Satoshi Kobayashi,  Takahiro Matsuo,  Masayuki Endo,  Masaru Sasago,  

[Date]1993/10/28
[Paper #]SDM93-114
Analysis of temperature and humidity effect on photoresist thickness

Rikio Ikeda,  

[Date]1993/10/28
[Paper #]SDM93-115
Etching rate and resist profile control in O_2RIE

Yasuki Kimura,  Ryouichi Aoyama,  Seki Suzuki,  Hiroshi Ohtsuka,  

[Date]1993/10/28
[Paper #]SDM93-116
Simulation and Analysis of Resist Pattern Fluctuation in Nanometer Lithography

Edward Schecklo,  Taro Ogawa,  Shoji Shukuri,  Toshiyuki Yoshimura,  Eiji Takeda,  

[Date]1993/10/28
[Paper #]SDM93-117
[OTHERS]

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[Date]1993/10/28
[Paper #]