Electronics-Integrated Circuits and Devices(Date:1998/07/24)

Presentation
表紙

,  

[Date]1998/7/24
[Paper #]
目次

,  

[Date]1998/7/24
[Paper #]
Formation of nm-thick Sio_2 at Low Temperatures by Activated Oxygen and Its Trap Analysis by Transient Discharge Current

K. Moriizumi,  T. Futatsuyama,  Y. Ueda,  T. Fuyuki,  H. Matsunami,  

[Date]1998/7/24
[Paper #]SDM98-92,ICD98-91
Gate Oxide Formation at Low Temperature using UV-O_2 Oxidation

A. Teramoto,  Y. Ohno,  H. Miyoshi,  

[Date]1998/7/24
[Paper #]SDM98-93,ICD98-92
A Study on Junction Profile near Si/Oxide Interface due to Transient Enhanced Diffusion Effect in MOSEFT

Jeonghwan Son,  Hyunwook Song,  Seungho Lee,  

[Date]1998/7/24
[Paper #]SDM98-94,ICD98-93
Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source

Dong Kyun Sohn,  Ji-Soo Park,  Byung Hak Lee,  Jin Won Park,  Jeong Soo Byun,  Jae Jeong Kim,  

[Date]1998/7/24
[Paper #]SDM98-95,ICD98-94
A Work Function Control Method of WSix Gate Electrode with Impurity Ion Implantation

Hiroshi. Komatsu,  Yoshihiro. Miyazawa,  

[Date]1998/7/24
[Paper #]SDM98-96,ICD98-95
Integration of Hydrogen Silsesquioxane(HSQ) as an Intermetal Dielectric(IMD)Material for 0.35_<μm> Technology

Hee-Sook Park,  Hong-Jae Shin,  Byung-Jun Kim,  Ho-Kyu Kang,  Moon-Yong Lee,  

[Date]1998/7/24
[Paper #]SDM98-97,ICD98-96
Thin Resist Approximation Model for Optical Proximity Correction

Chang-Nam Ahn,  Hee-Bom Kim,  Young-Mog Ham,  Yung-Mo Koo,  Ki-Ho Baik,  

[Date]1998/7/24
[Paper #]SDM98-98,ICD98-97
Implementation of isolation structures by top-surface imaging process

Hyoung-Gi Kim,  Myoung-Soo Kim,  Cheol-Kyu Bok,  Hyeong-Soo Kim,  Ki-Ho Baik,  

[Date]1998/7/24
[Paper #]SDM98-99,ICD98-98
Effect of Pt Electrode Orientation on SrBi_2Ta_2O_9 Thin Films Prepared by Sol-Gel Method

Ichiro Koiwa,  Hiroyo Kato,  Takao Kanehara,  Akira Hashimoto,  Yoshihiro Sawada,  Noboru Ichinose,  Tetsuya Osaka,  

[Date]1998/7/24
[Paper #]SDM98-100,ICD98-99
A Study on Advantage of Sol-Gel Method in forming Sr_2Bi_2TaO_9 Thin Films

Yoshihiro Sawada,  Akira Hashimoto,  Ichiro Koiwa,  Hiroyo Kato,  Takao Kanehara,  Tetsuya Osaka,  

[Date]1998/7/24
[Paper #]SDM98-101,ICD98-100
Effect of SOG(Spin on Glass)on formation of PbZr_<0.52>Ti_<0.48>O_3 for Metal-Ferroelectric-Insulator-Semiconductor(MFIS)structure

Yeon-Hwa Choi,  Chul-Ju Kim,  

[Date]1998/7/24
[Paper #]SDM98-102,ICD98-101
Growth of ferroelectric YMnO_3 thin films on Si(111)substrates by MBE method.

Shogo Imada,  Shigeto Shouriki,  Eisuke Tokumitsu,  Hiroshi Ishihara,  

[Date]1998/7/24
[Paper #]SDM98-103,ICD98-102
Electrical Properties of Ferroelectric Bi_4Ti_3O_12 Film Grown on Si Substrate Using Bi_2SiO_5 Buffer Layer

Takeshi KIJIMA,  Hironori MATSUNAGA,  

[Date]1998/7/24
[Paper #]SDM98-104,ICD98-103
Formation of Ferroelectric Thin Films for MFIS or MFMIS Structure

Byoung-Gon Yu,  Won-Jae Lee,  Jong-Son Lyu,  Jin-Hyo Lee,  Bo Woo Kim,  

[Date]1998/7/24
[Paper #]SDM98-105,ICD98-104
A Low Operating Voltage(3V) Metal-Ferroelectric-Semiconductor(MFS)FET's Using LiNbO_3/Si(100)Structures For Nonvolatile Memory Application

K wang-Ho Kim,  Chae-Gyu Kim,  Soon-Won Jung,  Sang-Woo Lee,  Jong-Son Lyu,  Byoung-Gon Yu,  Won-Jae Lee,  

[Date]1998/7/24
[Paper #]SDM98-106,ICD98-105
A Self-Reference Read Scheme for a 1T/1C FeRAM

Junichi Yamada,  Tohru Miwa,  Hiroki Koike,  Hideo Toyoshima,  

[Date]1998/7/24
[Paper #]SDM98-107,ICD98-106
Single Electron Devices Based on Nanocrystalline Silicon

Shunri Oda,  Dutta Amit,  

[Date]1998/7/24
[Paper #]SDM98-108,ICD98-107
A New Insight of MOSFET's for Low Power Circuit Applications

Jeong Inyoung,  Lee Hyeokjac,  Shin Jongshin,  Park Young-June,  

[Date]1998/7/24
[Paper #]SDM98-109,ICD98-108
12>> 1-20hit(25hit)