Electronics-Component Parts and Materials(Date:2019/11/07)

Presentation
Sb2S3 thin films deposited usnig thermal evaporation

Yasushi Takano(Shizuoka Univ.),  Sho Inoue(Shizuoka Univ.),  

[Date]2019-11-07
[Paper #]CPM2019-44
[Invited Talk] Metal oxide film growth by a catalytic reaction-assisted chemical vapor deposition

Kanji Yasui(Nagaoka Univ. Technol.),  

[Date]2019-11-07
[Paper #]CPM2019-48
Development of Methods for Early Detection of Plant Growth Disorder by Hyper/Multispectral Camera under Artificial Light

Koji Kashima(Tokyo Tech),  Shiho Torashima(Tokyo Tech),  Hiroyuki Ito(Tokyo Tech),  Katsuro Fukozu(Tokyo Tech),  Takayuki Ohba(Tokyo Tech),  

[Date]2019-11-07
[Paper #]
Study on Cu orientation control on ultra-thin TaWN film

Mayumi B. Takeyama(Kitami Inst. of Technol.),  Masaru Sato(Kitami Inst. of Technol.),  

[Date]2019-11-07
[Paper #]CPM2019-45
Annealing effects on the properties of nitrogen doped DLC films

Hiroya Osanai(Hirosaki Univ.),  Kazuki Nakamura(Hirosaki Univ.),  Haruto Koriyama(Hirosaki Univ.),  Yasuyuki Kobayashi(Hirosaki Univ.),  Yoshiharu Enta(Hirosaki Univ.),  Yushi Suzuki(Tohoku Univ.),  Maki Suemitsu(Tohoku Univ.),  Hideki Nakazawa(Hirosaki Univ.),  

[Date]2019-11-07
[Paper #]CPM2019-46
Nitrogen doping to ZnO films in a catalytic reaction assisted chemical vapor deposition

Ryuta Iba(NUT),  Hiroki Kambayashi(NUT),  Yuki Adachi(NUT),  Koichiro Oishi(NITNC),  Hironori Katagiri(NITNC),  Kanji Yasui(NUT),  

[Date]2019-11-07
[Paper #]CPM2019-47
Change in Electrical Characteristics with Change of Channel Structure in Integrated FET Using Piezoelectric Film P (VDF-TrFE) as Gate Insulator

Shusaku Matsumoto(Tokyo Univ. of Science),  Takuya Okayama(Tokyo Univ. of Science),  Akio Furukawa(Tokyo Univ. of Science),  

[Date]2019-11-08
[Paper #]CPM2019-50
Characterization of ZrNx films deposited at room temperature by RF sputtering

Masaru Sato(Kitami Inst. of Technol.),  Mayumi B. Takeyama(Kitami Inst. of Technol.),  

[Date]2019-11-08
[Paper #]CPM2019-49
[Invited Talk] Mapping of metal/semiconductor and semiconductor/semiconductor interfaces using scanning internal photoemission microscopy

Kenji Shiojima(Univ. of Fukui),  

[Date]2019-11-08
[Paper #]CPM2019-51