Electronics-Component Parts and Materials(Date:2018/08/09)

Presentation
Growth of graphene on SiC/AlN/Si(110) substrates

Hideki Nakazawa(Hirosaki Univ.),  Syunki Narita(Hirosaki Univ.),  Yuki Nara(Hirosaki Univ.),  Yoshiharu Enta(Hirosaki Univ.),  

[Date]2018-08-09
[Paper #]CPM2018-9
Developement of production-scale atomic layer deposition and its application for anticorrosion coating

Fumihiko Hirose(Yamagata),  

[Date]2018-08-09
[Paper #]CPM2018-11
Investigation of formation conditions of SiC buffer layers for SiC/SiC buffer layer/AlN/Si(110) multilayer structures

Yuki Nara(Hirosaki Univ.),  Asahi Kudo(Hirosaki Univ.),  Hideki Nakazawa(Hirosaki Univ.),  

[Date]2018-08-09
[Paper #]CPM2018-10
Study on the formation mechanism of Bi-mediated Ge nanodots fabricated by vacuum evaporation

Kazuto Tsushima(Hirosaki Univ.),  Kensuke Takita(Hirosaki Univ.),  Hideki Nakazawa(Hirosaki Univ.),  Takehiko Tawara(NTT),  Kouta Tateno(NTT),  Guoqiang Zhang(NTT),  Hideki Gotoh(NTT),  Takayuki Ikeda(NTT-AT),  Seiichiro Mizuno(NTT-AT),  Hiroshi Okamoto(Hirosaki Univ.),  

[Date]2018-08-09
[Paper #]CPM2018-12
Fabrication and properties of multiferroic composites for optical modulation

Yuichi Nakamura(Toyohashi Tech.),  Naohide Kamada(Toyohashi Tech.),  Taichi Goto(Toyohashi Tech.),  Hironaga Uchida(Toyohashi Tech.),  Mitsuteru Inoue(Toyohashi Tech.),  

[Date]2018-08-09
[Paper #]CPM2018-13
Effects of nitrogen doping on the properties of Si-doped DLC films

Kazuki Nakamura(Hirosaki Univ.),  Haruka Oohashi(Hirosaki Univ.),  Tai Yokoyama(Tohoku Univ.),  Kei-ichiro Tajima(Tohoku Univ.),  Norihumi Endo(Tohoku Univ.),  Maki Suemitsu(Tohoku Univ.),  Yoshiharu Enta(Hirosaki Univ.),  Yasuyuki Kobayashi(Hirosaki Univ.),  Yushi Suzuki(Hirosaki Univ.),  Hideki Nakazawa(Hirosaki Univ.),  

[Date]2018-08-09
[Paper #]CPM2018-8
Nitrogen doping to ZnO films using NO gas excited on heated Ir wire surface in a catalytic reaction-assisted chemical vapor deposition

Yuuki Adachi(Nagaoka Univ. Technol.),  Ryuta Iba(Nagaoka Univ. Technol.),  Shotarou Ono(Nagaoka Univ. Technol.),  Koichirou Ooishi(Nagaoka College),  Hironori Katagiri(Nagaoka College),  Kanji Yasui(Nagaoka Univ. Technol.),  

[Date]2018-08-10
[Paper #]CPM2018-14
Reduction reaction of SiO2 layer on Si substrate by irradiation of electron beam

Keisuke Fujimori(Hirosaki Univ.),  Yosuke Chida(Hirosaki Univ.),  Yusuke Masuda(Hirosaki Univ.),  Natsuki Ujiie(Hirosaki Univ.),  Yoshiharu Enta(Hirosaki Univ.),  

[Date]2018-08-10
[Paper #]CPM2018-18
Relationship between taste evaluation of Ezoshika meat and electrical measurement

Mayumi B. Takeyama(Kitami Inst. & Technol.),  Shinji Yokogawa(UEC),  Masaru Sato(Kitami Inst. & Technol.),  Takashi Yasui(Kitami Inst. & Technol.),  

[Date]2018-08-10
[Paper #]CPM2018-15
Characterization of ZrOxNy thin films deposited at low temperatures

Masaru Sato(kitami inst. of tech.),  Hideki Kitada(kitami inst. of tech.),  Mayumi B. Takeyama(kitami inst. of tech.),  

[Date]2018-08-10
[Paper #]CPM2018-16
Evaluation of rear surface passivation layer deposited by wet process

Ryosuke Watanabe(Hirosaki Univ.),  Tsubasa Koyama(Seikei Univ.),  Yoji Saito(Seikei Univ.),  

[Date]2018-08-10
[Paper #]CPM2018-17
Surface composition and chemical bond structure of Zr-based metallic glass

Haruto Koriyama(Hirosaki Univ.),  Keisuke Fujimori(Hirosaki Univ.),  Yoshiharu Enta(Hirosaki Univ.),  Nozomu Togashi(Adamant Namiki Precision Jewel),  

[Date]2018-08-10
[Paper #]CPM2018-19