Electronics-Component Parts and Materials(Date:2008/07/28)

Presentation
表紙

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[Date]2008/7/28
[Paper #]
目次

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[Date]2008/7/28
[Paper #]
Development of Surface Wave Plasma Generation Apparatus and Application to Semiconductor Processing

Hisashi FUKUDA,  Masakazu FURUKAWA,  

[Date]2008/7/28
[Paper #]CPM2008-41
Field Emission Characteristics of Sputter Deposited Carbon Films

Kei MIYAZAKI,  Yoshiyuki TAGUCHI,  Hirofumi SAITO,  Takuya MIYANAGA,  Tomohiko YAMAKAMI,  Rinpei HAYASHIBE,  Kiichi KAMIMURA,  

[Date]2008/7/28
[Paper #]CPM2008-42
Preparation of Mg-Ni Thin Films by Alternation Layer Deposition Method

Hidehiko SHIMIZU,  Makoto HIRATA,  Tomohiro OKADA,  Haruo IWANO,  Takahiro KAWAKAMI,  

[Date]2008/7/28
[Paper #]CPM2008-43
Organic Thin Film Transistor with Substituted Polyacetylenes containing Hetero Atoms

Tetsuya IMAMURA,  Yasuteru MAWATARI,  Hisashi FUKUDA,  Masayoshi TABATA,  

[Date]2008/7/28
[Paper #]CPM2008-44
Poly-3-hexylthiophene Thin Film Formation and Application to Organic Thin Film Transistor

Hisashi FUKUDA,  Katsuhiro UESUGI,  

[Date]2008/7/28
[Paper #]CPM2008-45
Pentacene Thin Film Formation and Application to Organic Transistor

Yoshihiro TADA,  Shinya YAMADA,  Katsuhiro UESUGI,  Hisashi FUKUDA,  

[Date]2008/7/28
[Paper #]CPM2008-46
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[Date]2008/7/28
[Paper #]
Notice for Photocopying

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[Date]2008/7/28
[Paper #]
奥付

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[Date]2008/7/28
[Paper #]