Electronics-Component Parts and Materials(Date:1995/09/30)

Presentation
表紙

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[Date]1995/9/30
[Paper #]
目次

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[Date]1995/9/30
[Paper #]
Growth of High Quality SiN-BN Thin Films by Hybrid Plasma CVD Method

Kenichiro Ijichi,  Hidetaka Itoh,  Kanji Yasui,  Tadashi Akahane,  

[Date]1995/9/30
[Paper #]CPM95-70
Growth and Evaluation of Cubic GaN Films by ECR Plasma Enhanced Metalorganic Chemical Vapor Deposition

Tomoaki HARADA,  Hironori YOSHIDA,  Kanji YASUI,  Tadashi AKAHANE,  

[Date]1995/9/30
[Paper #]CPM95-71
Preparation of SiC thin films by plasma CVD method using SiH_2Cl_2 as a source gas

T Ogawa,  M Yumoto,  M Nakao,  K Kamimura,  Y Onuma,  

[Date]1995/9/30
[Paper #]CPM95-72
Preparation of CuInSe_2 films deposited by 3-stage process with In_2Se_3 and Cu

Ken KUBOTA,  Chiaki NISHIMAKI,  Masanori TOMITA,  Hironori KATAGIRI,  

[Date]1995/9/30
[Paper #]CPM95-73
Effects of thermal annealing on the properties of CuInSe_2 thin films

Kazuhito NISHIKATA,  Eiji HIURA,  Yuko TSUKADA,  Gyejong AN,  Hironori KATAGIRI,  

[Date]1995/9/30
[Paper #]CPM95-74
Solar Cells Consisting of CuIn(S,Se)_2 Thin Films Synthesized by Sulfurization

T. Ohashi,  Jager-Waldau A.,  T. Miyazawa,  Y. Hashimoto,  K. Ito,  

[Date]1995/9/30
[Paper #]CPM95-75
Vapor Phase Epitaxy of CuAlS_2 Using Organic- and Inorganic-metalchlorides

Jugo Mitomo,  Nozomu Tsuboi,  Seishi Iida,  

[Date]1995/9/30
[Paper #]CPM95-76
[OTHERS]

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[Date]1995/9/30
[Paper #]