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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 14 of 14  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
MRIS, CPM, ITE-MMS, OME [detail] 2023-10-27
10:30
Niigata Niigata Univ. Ekiminami Campus
(Primary: On-site, Secondary: Online)
Mechanical properties and heat resistance of Si- and N-doped diamond-like carbon films
Yuya Yamazaki, Yuya Sasaki, Hideki Nakazawa (Hirosaki Univ.) MRIS2023-17 CPM2023-51 OME2023-38
Silicon- and nitrogen-doped diamond-like carbon (Si–N–DLC) films have been deposited by plasma-enhanced chemical vapor d... [more] MRIS2023-17 CPM2023-51 OME2023-38
pp.33-36
CPM 2021-10-27
13:20
Online Online Effects of H2 and Ar dilution on the optical and electrical properties of Si and N doped diamond-like carbon films by plasma-enhanced chemical vapor deposition
Yuya Sasaki, Hiroya Osanai, Yusuke Ohtani, Yuta Murono, Masayoshi Sato, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki, Hideki Nakazawa (Hirosaki Univ.) CPM2021-26
We have deposited silicon and nitrogen doped diamond-like carbon (Si–N–DLC) films by radio frequency plasma-enhanced che... [more] CPM2021-26
pp.23-28
CPM 2019-11-07
15:00
Fukui Fukui univ. Annealing effects on the properties of nitrogen doped DLC films
Hiroya Osanai, Kazuki Nakamura, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Maki Suemitsu (Tohoku Univ.), Hideki Nakazawa (Hirosaki Univ.) CPM2019-46
We have prepared nitrogen doped diamond-like carbon (N-DLC) films by plasma-enhanced chemical vapor deposition using H2 ... [more] CPM2019-46
pp.9-14
CPM, IEE-MAG 2018-11-02
14:25
Niigata Machinaka campus Nagaoka Thermal stability of silicon and nitrogen doped DLC thin films
Hideki Nakazawa, Kazuki Nakamura, Hiroya Osanai, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Maki Suemitsu (Tohoku Univ.) CPM2018-52
We have investigated the effects of post-annealing on the properties of silicon and nitrogen doped diamond-like carbon (... [more] CPM2018-52
pp.99-104
CPM 2018-08-09
14:30
Aomori Hirosaki Univ. Effects of nitrogen doping on the properties of Si-doped DLC films
Kazuki Nakamura, Haruka Oohashi (Hirosaki Univ.), Tai Yokoyama, Kei-ichiro Tajima, Norihumi Endo, Maki Suemitsu (Tohoku Univ.), Yoshiharu Enta, Yasuyuki Kobayashi, Yushi Suzuki, Hideki Nakazawa (Hirosaki Univ.) CPM2018-8
We have investigated the effects of nitrogen (N) doping on the chemical bonding states and the electrical, optical, and ... [more] CPM2018-8
pp.1-6
CPM 2015-08-10
13:40
Aomori   Effects of substrate bias on properties of nitrogen-doped DLC films prepared by radio frequency plasma-enhanced chemical vapor deposition
Masato Tsuchiya, Kazuki Murakami, Tatsuhito Satou, Takahiro Takami, Yoshiharu Enta, Hideki Nakazawa (Hirosaki Univ.) CPM2015-32
We have deposited nitrogen-doped diamond-like carbon (N-DLC) films by RF plasma-enhanced chemical vapor deposition using... [more] CPM2015-32
pp.7-10
ED 2012-07-27
11:50
Fukui Fukui University Graphene FET with Diamondlike Carbon Dielectrics
Susumu Takabayashi, Meng Yang, Shuichi Ogawa, Hiroyuki Hayashi, Yuki Kurita, Yuji Takakuwa, Tetsuya Suemitsu, Taiichi Otsuji (Tohoku Univ.) ED2012-53
A graphene-channel field effect transistor with a diamondlike carbon (DLC) top-gate dielectric film is presented (DLC-GF... [more] ED2012-53
pp.67-72
SDM 2012-03-05
13:00
Tokyo Kikai-Shinko-Kaikan Bldg. Initial Growth Observation of Multilayer Graphene on SiO2/Si substrate using Raman Spectroscopy and XPS
Yoshihiro Ojiro, Shuichi Ogawa (Tohoku Univ.), Manabu Inukai (JASRI), Motonobu Sato (AIST), Eiji Ikenaga, Takayuki Muro (JASRI), Mizuhisa Nihei (AIST), Yuji Takakuwa (Tohoku Univ.), Naoki Yokoyama (AIST) SDM2011-179
The photoemission-assisted Plasma enhanced CVD is the one of the most possible method to grow graphene in the low temper... [more] SDM2011-179
pp.19-24
CPM 2011-08-10
15:45
Aomori   Hydrogen effects on the properties of Si- and N-coincorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Saori Okuno, Soshi Miura, Ryosuke Kamada, Hideki Nakazawa (Hirosaki Univ.) CPM2011-62
To further improve the properties of diamond-like carbon (DLC) films, we have deposited Si- and N-coincorporated DLC (Si... [more] CPM2011-62
pp.31-36
SDM, ED 2011-02-23
16:05
Hokkaido Hokkaido Univ. Characterization of carbon nanotube thin-film transistors by scanning probe microscopy
Yuki Okigawa, Yutaka Ohno (Nagoya Univ.), Shigeru Kishimoto (Nagoya Univ./VBL, Nagoya Univ.), Takashi Mizutani (Nagoya Univ.) ED2010-197 SDM2010-232
The electrical properties of CNT-FETs fabricated using PECVD were studied by scanning probe microscopy. The measured res... [more] ED2010-197 SDM2010-232
pp.31-36
SDM 2011-02-07
13:10
Tokyo Kikai-Shinko-Kaikan Bldg. Networked nanographite growth using photoemission-assisted enhanced plasma CVD: discharge condition dependence of the crystallographic quality
Shuichi Ogawa (Tohoku Univ./JST), Motonobu Sato (Fujitsu/JST), Haruki Sumi (Tohoku Univ.), Mizuhisa Nihei (Fujitsu/JST), Yuji Takakuwa (Tohoku Univ./JST) SDM2010-220
he photoemission-assisted plasma chemical vapor deposition has been developed to form the graphene for large area withou... [more] SDM2010-220
pp.25-30
CPM 2009-08-10
16:05
Aomori Hirosaki Univ. Characterization of Diamond-Like Carbon Thin Films Prepared by Radio-Frequency Pasma-Ehanced CVD Using Organosilanes
Soushi Miura, Hideki Nakazawa, Keita Nishizaki (Hirosaki Univ.), Maki Suemitsu (RIEC Tohoku Univ.), Kanji Yasui (Nagaoka Univ. of Tech.), Takashi Ito, Tetsuo Endoh (CIR Tohoku Univ.), Yuzuru Narita (Yamagata Univ.) CPM2009-36
To further improve the properties of diamond-like carbon (DLC) films, we have deposited Si-incorporated DLC (Si-DLC) fil... [more] CPM2009-36
pp.13-18
OME, SDM 2009-04-24
17:05
Saga AIST Kyushu-center Metal Induced Lateral Crystallization of PECVD a-Si and Its Impact on TFT Performance
Shintaro Kanoh, Sho Nagata, Gou Nakagawa, Tanemasa Asano (Kyushu Univ.) SDM2009-7 OME2009-7
In the case of solid phase crystallization of amorphous Si (a-Si) deposited by plasma-enhanced chemical vapor deposition... [more] SDM2009-7 OME2009-7
pp.29-34
CPM 2007-08-09
15:45
Yamagata Yamagata Univ. Vertically Aligned CNT Growth on Sectional Plane of Catalytic Thin Film Using DC Plasma-Enhanced CVD
Hiroki Okuyama, Takuya Sonomura, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) CPM2007-41
Position and/or direction controlling of CNTs is a necessary process technology to prepare nanoscaled CNT electronic dev... [more] CPM2007-41
pp.27-32
 Results 1 - 14 of 14  /   
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