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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2023-07-31
16:10		 Hokkaido
(Primary: On-site, Secondary: Online)		 [Invited Talk] Improvement of adhesion and plating of fluoropolymers by plasma surface modification
Yasuyuki Kobayashi, Shingo Ikeda (ORIST) CPM2023-16		 Fluoropolymers have excellent chemical and heat resistance properties, and their use is expanding in many industrial fie... [more] CPM2023-16
pp.17-20
OME 2021-12-24
16:25		 Online Online [Invited Talk] Preparation of fluoropolymer thin films by physical vapor deposition for optical applications
Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) OME2021-34		 Fluoropolymers have such unique characteristics as low refractive index, low dielectric constant, low optical and dielec... [more] OME2021-34
pp.32-37
OME, OPE 2012-11-16
13:05		 Tokyo Kikai-Shinko-Kaikan Bldg. Antireflective Characteristics of Functionally-Graded Fluoropolymer Thin Films Prepared by Vapor-Deposition Polymerization
Kazuo Senda (Micro Eng. Inc.), Tsuyoshi Matsuda, Takumi Kawanishi, Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) OME2012-55 OPE2012-127		 Fluoropolymer thin films were prepared by the ion-assisted vapor deposition polymerization (IAD) of 2- (peruorohexyl) et... [more] OME2012-55 OPE2012-127
pp.1-5
EMD, CPM, OME 2011-06-30
15:30		 Tokyo   Adhesion Improvement of Fluoropolymer Thin Films by Ion-Assisted Vapor Deposition Polymerization
Kazuo Senda, Tsuyoshi Matsuda, Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) EMD2011-15 CPM2011-51 OME2011-29		 A novel dry process for depositing fluoropolymer thin film was developed by vapor deposition polymerization under the as... [more] EMD2011-15 CPM2011-51 OME2011-29
pp.41-46
OME 2010-10-22
13:25		 Tokyo NTT Musashino R&D Center Deposition polymerization of fluoropolymer thin films by ion-assisted vapor deposition
Tsuyoshi Matsuda (Tokyo Univ. Agricul. & Technol.), Kazuo Senda (Sumitomo Precision), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. Agricul. & Technol.) OME2010-47		 Ion-assisted deposition was employed as a new technique for preparing fuluoropolymer thin films. A fluorinated alkylacr... [more] OME2010-47
pp.5-10
OME 2009-05-22
09:55		 Tokyo Kikai-Shinko-Kaikan Bldg. Physical Vapor Deposition of Fluoropolymer Thin Films and Their Characteristics as Antireflective Coating
Yasuhiro Hosoda (Tokyo Univ. of Agr & Tech.), Yuji Muraoka, Takashi Fujita, Shinsuke Morii (Komatsulite Mfg.Co.,Ltd.), Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. of Agr & Tech.) OME2009-9		 Electron-assisted physical vapor deposition polymerization was employed to prepare fluoropolymer thin films for antirefl... [more] OME2009-9
pp.3-7
 Results 1 - 6 of 6  /   
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