IEICE Technical Committee Submission System
Conference Schedule
Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

All Technical Committee Conferences  (Searched in: All Years)

Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 20 of 24  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
MRIS, ITE-MMS 2013-07-12
13:50
Tokyo Chuo Univ. Surface Flatness Control of Ferromagnetic Alloy Thin Films with L10 Ordered Structure
Akira Itabashi, Mitsuru Ohtake (Chuo Univ.), Fumiyoshi Kirino (Tokyo University of the Arts), Masaaki Futamoto (Chuo Univ.) MR2013-7
FePd, FePt, and CoPt alloy epitaxial thin films with L10 structure are prepared on (001) single-crystal substrates of Mg... [more] MR2013-7
pp.7-12
US 2012-09-24
14:45
Akita Tegata Campus, Akita Univ. Fabrication of polarity-inverted ZnO films using ion bombardment to the substrate during an RF magnetron sputtering
Ryo Ikoma (Doshisha Univ.), Takahiko Yanagitani (Nagoya Inst.Tech.), Shinji Takayanagi (Doshisha Univ.), Masashi Suzuki (Nagoya Inst.Tech.), Hiroyuki Odagawa (Kumamoto NCT), Mami Matsukawa (Doshisha Univ.) US2012-61
ZnO have been used as SAW devices and high frequency transducer owing to its high electromechanical coupling. In general... [more] US2012-61
pp.21-25
ED, SDM, CPM 2012-05-18
14:50
Aichi VBL, Toyohashi Univ. of Technol. Preparation and evaluation of LiMn2O4 films prepared by sputtering method
Akio Niwa, Masaaki Isai, Mitsuhiro Nakamura, Takashi Noguchi (Shizuoka Univ.) ED2012-37 CPM2012-21 SDM2012-39
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. In this research, w... [more] ED2012-37 CPM2012-21 SDM2012-39
pp.99-104
ED, SDM, CPM 2012-05-18
15:15
Aichi VBL, Toyohashi Univ. of Technol. Co-catalyitic effect on improving the photocatalytic properties of TiO2 films
Masaaki Isai, Ikuta Nakamura, Yuuki Hieda, Fumiya Fukazawa (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytech.Univ.) ED2012-38 CPM2012-22 SDM2012-40
Abstract TiO2 films were prepared with RF magnetron sputtering method. The copper (cu) and iron (Fe) films were deposit... [more] ED2012-38 CPM2012-22 SDM2012-40
pp.105-109
CPM 2011-10-26
13:50
Fukui Fukui Univ. Properties of AZO Thin Films Deposited at Room Temperature by the RF-DC Coupled Magnetron Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Yusuke Tomiguchi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) CPM2011-111
In order to examine that influence of low voltage sputtering method on properties of AZO thin films, deposition of AZO t... [more] CPM2011-111
pp.11-15
CPM 2011-08-11
09:25
Aomori   Preparation of Transparent Conducting AZO Thin Films by RF Magnetron Sputtering
Takeshi Umehara, Satoru Noge (Numazu NCT) CPM2011-67
In this study, the results of the study of thin film deposition conditions of AZO thin film by RF magnetron sputtering m... [more] CPM2011-67
pp.55-60
EMD, CPM, OME 2011-06-30
16:55
Tokyo   Properties of AZO Thin Films Deposited at Room temperature by Low Voltage Sputtering Method
Jun Kashiide, Katsuhito Nagoshi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Kotaro Nagata, Yasuo Fukushima, Nozomu Tsuboi, Takahiro Nomoto (Niigata Univ.) EMD2011-18 CPM2011-54 OME2011-32
In order to examine that effect of high energy particles and fabricated conditions of targets, such as sintering tempera... [more] EMD2011-18 CPM2011-54 OME2011-32
pp.59-63
CPM, SDM, ED 2011-05-20
13:50
Aichi Nagoya Univ. (VBL) Stabilized Pt deposition on the TiO2 films and their photocatalytic properties
Ikuta Nakamura, Takanori Sato, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo polytech.Univ.) ED2011-28 CPM2011-35 SDM2011-41
TiO2 films were prepared with RF magnetron sputtering method. The platinum (Pt) films were deposited on the TiO2 films. ... [more] ED2011-28 CPM2011-35 SDM2011-41
pp.139-143
CPM, SDM, ED 2011-05-20
14:15
Aichi Nagoya Univ. (VBL) Preparation and evaluation of LiMn2O4 films prepared by sputtering method
Mitsuhiro Nakamura, Akio Niwa, Masaaki Isai (Shizuoka Univ.) ED2011-29 CPM2011-36 SDM2011-42
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. In this research, w... [more] ED2011-29 CPM2011-36 SDM2011-42
pp.145-149
US 2010-09-30
10:50
Miyagi Tohoku Univ. c-axis parallel oriented ZnO film depositions by RF bias sputtering -- The effect of bias frequency on the orientation --
Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Nagoya Inst. Tech.), Mami Matsukawa, Yoshiaki Watanabe (Doshisha Univ.) US2010-62
ZnO films where the crystallite c-axis is unidirectionally-aligned and parallel to the substrate plane [(11-20) or (10-2... [more] US2010-62
pp.75-80
SDM, CPM, ED 2010-05-14
10:25
Shizuoka Shizuoka University (Hamamatsu Campus) Investigation of deposition condition of LiMn2O4 films prepared by RF magnetron sputtering
Mitsuhiro Nakamura, Masaaki Isai (Shizuoka Univ.) ED2010-26 CPM2010-16 SDM2010-26
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. This research was d... [more] ED2010-26 CPM2010-16 SDM2010-26
pp.51-55
SDM, CPM, ED 2010-05-14
11:30
Shizuoka Shizuoka University (Hamamatsu Campus) Preparation of Pt-deposited TiO2 films and evaluation of photocatalystic properties
Ikuta Nakamura, Tatsuya Ito, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2010-28 CPM2010-18 SDM2010-28
This research was designed for planning a progress of photocatalystic properties of TiO2 thin films with depositing Pt p... [more] ED2010-28 CPM2010-18 SDM2010-28
pp.61-64
US 2009-09-30
09:00
Hokkaido Noboribetsu Grand Hotel Multilayer shear mode resonator consisting of c-axis tilted ZnO films.
Noki Morisato, Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Nagoya Inst. of Tech.), Mami Matsukawa, Yoshiaki Watanabe (Doshisha Univ.) US2009-47
In a previous study, we have reported c-axis 23° tilted ZnO film for shear wave excitations. We here propose a new multi... [more] US2009-47
pp.53-58
US 2009-09-30
09:50
Hokkaido Noboribetsu Grand Hotel Large-area fabrication of (11-20) textured ZnO piezoelectric films using magnetron sputtering with linear erosion.
Takayuki Kawamoto (Doshisha Univ./Omron Corp.), Takahiko Yanagitani (Nagoya Inst. Tech.), Mami Matsukawa, Yoshiaki Watanabe (Doshisha Univ.), Yoshikazu Mori, Syo Sasaki, Masatoshi Oba (Omron Corp.) US2009-49
In previous studies, fabrication of (11-20) textured ZnO piezoelectric films have been reported by using RF magnetron sp... [more] US2009-49
pp.65-70
US 2009-09-30
11:45
Hokkaido Noboribetsu Grand Hotel Characterization of ZnO Polycrystalline Films on Silica Glass by the LFB Ultrasonic Material Characterization System
Takanori Kondo, Sho Yoshida, Yuusuke Kourai, Yuji Ohashi, Mototaka Arakawa, Jun-ichi Kushibiki (Tohoku Univ.), Satoshi Fujii (SEIKO EPSON) US2009-53
We evaluated several ZnO polycrystalline films with different thicknesses fabricated on silica glass substrates by DC sp... [more] US2009-53
pp.89-94
ED, CPM, SDM 2009-05-14
14:20
Aichi Satellite Office, Toyohashi Univ. of Technology Effect of quartz tube on crystal properties of LiMn2O4 films prepared by RF magnetron sputtering
Takayuki Hosokawa, Satoshi Sekigawa, Masaaki Isai (Shizuoka Univ.) ED2009-20 CPM2009-10 SDM2009-10
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. The LiMn2O4 powder ... [more] ED2009-20 CPM2009-10 SDM2009-10
pp.11-15
ED, CPM, SDM 2009-05-14
15:25
Aichi Satellite Office, Toyohashi Univ. of Technology Preparation of TiO2 thin films by RF magnetron sputtering method and their photocatalytic properties
Tatsuya Ito, Tatsuya Endo, Masaaki Isai (Shizuoka Univ.), Tetsuya Sakai, Yoichi Hoshi (Tokyo Polytech. Univ.) ED2009-22 CPM2009-12 SDM2009-12
Low-temperature preparation of the TiO2 thin films was examined by using a RF magnetron sputtering method was examined. ... [more] ED2009-22 CPM2009-12 SDM2009-12
pp.21-24
CPM 2008-10-31
09:50
Niigata Niigata Univ. Examination of Ar ion bombardment effect to ITO Thin Films
Saki Takahashi, Masato Niki, Youhei Nakamura, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.) CPM2008-84
In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was at... [more] CPM2008-84
pp.53-58
CPM, ED, SDM 2008-05-15
13:00
Aichi Nagoya Institute of Technology Effect of doughnut-type plate on crystal properties of LiMn2O4 films prepared by RF magnetron sputtering
Takayuki Hosokawa, Kouichi Nakamura, Shunsuke Hosoe, Satoshi Sakai, Masaaki Isai (Shizuoka Univ.) ED2008-1 CPM2008-9 SDM2008-21
The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. The LiMn2O4 powder ... [more] ED2008-1 CPM2008-9 SDM2008-21
pp.1-6
CPM, ED, SDM 2008-05-15
13:25
Aichi Nagoya Institute of Technology Preparation of LiMn2O4 films by RF magnetron sputtering
Kouichi Nakamura, Takayuki Hosokawa, Satoshi Sakai, Shunsuke Hosoe, Masaaki Isai (Shizuoka Univ.) ED2008-2 CPM2008-10 SDM2008-22
Manganese oxides have been focused as a cathode material for Li secondary batteries. Preparation of LiMn2O4 thin films w... [more] ED2008-2 CPM2008-10 SDM2008-22
pp.7-10
 Results 1 - 20 of 24  /  [Next]  
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan