Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
VLD, DC, RECONF, ICD, IPSJ-SLDM [detail] |
2022-11-30 10:45 |
Kumamoto |
(Primary: On-site, Secondary: Online) |
Mask Optimization Using Voronoi Partition and Iterative Improvement Naoki Nonaka, Yukihide Kohira (Univ. of Aizu), Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64 |
To realize continuously scaling down technology node, progressing manufacturing process by optical lithography is requir... [more] |
VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64 pp.127-132 |
VLD, DC, RECONF, ICD, IPSJ-SLDM (Joint) [detail] |
2021-12-02 15:35 |
Online |
Online |
Mask Optimization Method Using Simulated Quantum Annealing Yukihide Kohira, Haruki Nakayama, Naoki Nonaka (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA Corporation) VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 |
To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is req... [more] |
VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 pp.162-167 |
HWS, VLD [detail] |
2020-03-04 16:00 |
Okinawa |
Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] |
VLD2019-105 HWS2019-78 pp.65-70 |
HWS, VLD [detail] |
2020-03-04 16:50 |
Okinawa |
Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.) VLD2019-107 HWS2019-80 |
In lithography, a circuit pattern that is highly likely to cause an undesired open- and short-circuit after transfer is ... [more] |
VLD2019-107 HWS2019-80 pp.77-82 |
VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 16:35 |
Ehime |
Ehime Prefecture Gender Equality Center |
Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-53 DC2019-77 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] |
VLD2019-53 DC2019-77 pp.197-202 |
VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2018-12-07 14:10 |
Hiroshima |
Satellite Campus Hiroshima |
Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56 |
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in ... [more] |
VLD2018-70 DC2018-56 pp.209-214 |
VLD, IPSJ-SLDM |
2018-05-16 15:50 |
Fukuoka |
Kitakyushu International Conference Center |
Pixel-based OPC using Quadratic Programming for Mask Optimization Rina Azuma, Yukihide Kohira (Univ. of Aizu) VLD2018-3 |
Due to continuous shrinking of Critical Dimensions (CD) in semiconductor manufacturing, advance of process technology in... [more] |
VLD2018-3 pp.31-36 |
SDM, EID |
2017-12-22 10:30 |
Kyoto |
Kyoto University |
Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell Nakai Yuya, Ishikawa Yasuaki, Uraoka Yukiharu (NAIST) EID2017-11 SDM2017-72 |
For the purpose of the realization of thin-type crystal silicon solar cells, a light trapping effect in a light absorpti... [more] |
EID2017-11 SDM2017-72 pp.1-4 |
OPE, EST, LQE, EMT, PN, MWP, IEE-EMT [detail] |
2017-01-19 15:25 |
Mie |
Iseshi Kanko Bunka Kaikan |
Fabrication and optical characterization of the optical element by the Au two-dimensional diffraction grating structure Taishi Yamada, Atsushi Motogaito, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.) PN2016-82 EMT2016-111 OPE2016-157 LQE2016-146 EST2016-121 MWP2016-95 |
For the realization of the optical mirror, we fabricated the Au two-dimensional diffraction grating using an electron be... [more] |
PN2016-82 EMT2016-111 OPE2016-157 LQE2016-146 EST2016-121 MWP2016-95 pp.269-272 |
OPE |
2016-12-08 14:15 |
Okinawa |
|
Effects of Fabrication Variation on the Performance of Silicon Waveguide Devices Tsuyoshi Horikawa (PETRA/AIST), Daisuke Shimura, Jun Ushida, Yohei Sobu, Akemi Shiina, Masatoshi Tokushima, Seok-Hwan Jeong, Keizo Kinoshita, Tohru Mogami (PETRA) |
Silicon photonics has been expected as a key technology which is enable to integrate functionalities in a single chip fo... [more] |
|
OCS, OPE |
2015-05-15 16:20 |
Tokyo |
Kikai-Shinko-Kaikan Bldg(Tokyo) |
32x32 Strictly Non-Blocking Si-Wire Optical Path Switch Ken Tanizawa, Keijiro Suzuki, Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino (AIST), Toshio Sugaya (Furukawa Electric), Satoshi Suda, Guangwei Cong (AIST), Toshio Kimura (Furukawa Electric), Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima (AIST) OCS2015-8 OPE2015-8 |
In order to realize dynamic optical path networks that transmit coarse-granular video traffics with ultra-low energy con... [more] |
OCS2015-8 OPE2015-8 pp.33-38 |
VLD |
2015-03-02 13:00 |
Okinawa |
Okinawa Seinen Kaikan |
A Fast Lithographic Mask Correction Algorithm Ahmd Awad, Atsushi Takahashi (Tokyo Institute of Technology) VLD2014-153 |
As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity
Correction (OP... [more] |
VLD2014-153 pp.1-6 |
OPE, LQE |
2014-12-18 11:05 |
Tokyo |
Kikai-Shinko-Kaikan, NTT Atsugi R&D center |
Fabrication of the 2D metal grating structure for the application to an optical filter and optical characterization Masanori Kito, Atsushi Motogaito, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.) OPE2014-141 LQE2014-128 |
As heat-ray shielding steps replacing conventional technique, we fabricated the 2D metal grating structure by electron b... [more] |
OPE2014-141 LQE2014-128 pp.11-14 |
OPE |
2012-12-21 16:45 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Characteristics of InP-based passive devices of Si substrate with BCB adhesive wafer bonding for on-chip interconnects Jieun Lee, Yoshiaki Yamahara, Yuki Atsumi, Nobuhiko Nishiyama (TiTech), Shigehisa Arai (TiTech/QNERC) OPE2012-141 |
For InP-based membrane photonic circuits on Si-LSI, a GaInAsP wire waveguide and basic functional passive devices based ... [more] |
OPE2012-141 pp.39-44 |
PN |
2011-08-01 15:10 |
Hokkaido |
Hakodate-shi Kinrousha Sougou Fukushi Center |
[Invited Talk]
GI-core polymer optical waveguide to high-speed and high-density on-board interconnection Takaaki Ishigure (Keio Univ.) PN2011-16 |
Optical interconnection has been highly anticipated as a promising technology for next generation high-performance compu... [more] |
PN2011-16 pp.25-30 |
OME |
2010-03-15 10:50 |
Miyagi |
Tohoku Univ. |
[Invited Talk]
Preparation of Nanoparticle-Doped Hybrid Polymers and Photonic Applications Okihiro Sugihara, Bin Cai, Hendry I. Elim, Toshikuni Kaino (Tohoku Univ.), Kyoji Komatsu (Sendai National College of Tech.) OME2009-91 |
High refractive index and transparent polymer materials are of great importance for various kinds of photonic device app... [more] |
OME2009-91 pp.17-22 |
OFT, OPE |
2009-03-06 10:35 |
Tokyo |
Kikai-Shinko-Kaikan Bldg |
Characterization of atom-tag formed by doped-glasses Naokatsu Yamamoto (NICT), Masato Izumi, Hiroki Fujioka (Tokyo Denki Univ.), Kouichi Akahane (NICT), Hideyuki Sotobayashi (Aoyama Gakuin Univ.), Hiroshi Takai (Tokyo Denki Univ.) OFT2008-90 OPE2008-190 |
Atomic tag was newly proposed for an information security and a tracer application. Atom distributions in the atomic tag... [more] |
OFT2008-90 OPE2008-190 pp.15-18 |
PN, OPE, EMT, LQE |
2009-01-29 08:30 |
Kyoto |
Kyoto Institute Technology (Matsugasaki Campus) |
Fabrication of Blazed Grating by Using Phase-Shifting Mask Hideyuki Awazu (Kyoto Inst. Technol.), Kenji Kintaka (AIST), Kenzo Nishio, Yasuhiro Awatsuji, Shogo Ura (Kyoto Inst. Technol.), Junji Nishii (AIST) PN2008-42 OPE2008-145 LQE2008-142 |
A new simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis fo... [more] |
PN2008-42 OPE2008-145 LQE2008-142 pp.1-6 |
EMD, CPM, LQE, OPE |
2006-08-25 13:00 |
Hokkaido |
Chitose Arcadia Plaza |
[Invited Talk]
Optical Data Transmission Module Using Polymer Waveguide Shigemi Ohtsu, Toshihiko Suzuki, Akira Fujii, Kazutoshi Yatsuda, Keishi Shimizu, Eiichi Akutsu (Fuji Xerox) |
We are researching the optical interconnection technology using the polymer waveguide production method named LAMM(Large... [more] |
EMD2006-41 CPM2006-71 OPE2006-83 LQE2006-48 pp.87-92 |