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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 13 of 13  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2023-10-13
13:00
Miyagi Niche, Tohoku Univ. [Invited Talk] Defect Reduction in UV Nanoimprint Lithography
Toshiki ITO (Canon) SDM2023-54
Field-by-field type UV nanoimprint lithography equipped with on-demand inkjet dispense system has been developed, which ... [more] SDM2023-54
pp.1-6
CPM, LQE, ED 2019-11-22
10:00
Shizuoka Shizuoka Univ. (Hamamatsu) Experimental study on the antireflection nanotexture for organic photovoltaics
Kenta Hiraga, Shigeru Kubota, Kensaku Kanomata, Bashir Ahmmad (Yamagata Univ.), Jun Mizuno (Waseda Univ.), Fumihiko Hirose (Yamagata Univ.) ED2019-48 CPM2019-67 LQE2019-91
Organic solar cells have attracted a lot of attention as the energy supply devices for near future, because they have su... [more] ED2019-48 CPM2019-67 LQE2019-91
pp.65-68
SDM, EID 2017-12-22
10:30
Kyoto Kyoto University Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell
Nakai Yuya, Ishikawa Yasuaki, Uraoka Yukiharu (NAIST) EID2017-11 SDM2017-72
For the purpose of the realization of thin-type crystal silicon solar cells, a light trapping effect in a light absorpti... [more] EID2017-11 SDM2017-72
pp.1-4
ICD 2017-04-20
13:00
Tokyo   [Invited Talk] Study on Nano-Dot Structure Permanent Memory
Tsuyoshi Watanabe, Noriyuki Miura, Shijia Liu, Shigeki Imai, Makoto Nagata (Kobe Univ.) ICD2017-4
We propose a permanent digital memory system in which data is saved by a presence of metal nano-dot at interconnects of ... [more] ICD2017-4
pp.17-22
ED, SDM 2017-02-24
10:50
Hokkaido Centennial Hall, Hokkaido Univ. Fabrication of Zinc Oxide-based Thin Films Transistors by a Solution Process and a Direct Patterning of Oxide Thin Films by a Thermal Nanoimprint Method
Fumiya Kimura, Alhanaki Abdullah, Yi Sun, Shota Sasaki, Koki Nagayama, Masatoshi Koyama, Toshihiko Maemoto, Shigehiko Sasa (OIT) ED2016-132 SDM2016-149
Zinc oxide (ZnO) is transparent semiconductor material in visible light wavelength because it has band gap energy of 3.3... [more] ED2016-132 SDM2016-149
pp.13-16
LQE, ED, CPM 2014-11-27
14:30
Osaka   Two-Dimensional Strain Mapping of GaN Templates Fabricated by Nano-Channel FIELO Method Using Nanoimprint Lithography
Masanori Nambu, Atsushi Yamaguchi (Kanazawa Inst. of Tech.), Hiroki Goto, Haruo Sunakawa, Toshiharu Matsueda (Furukawa Co. Ltd.), Akiko Okada (Waseda Univ.), Hidetoshi Shinohara, Hiroshi Goto (Toshiba Machine Co. Ltd.), Jun Mizuno (Waseda Univ.), Akira Usui (Furukawa Co. Ltd.) ED2014-80 CPM2014-137 LQE2014-108
The efficiency droop phenomenon is a big problem for high-brightness white LEDs. It has been pointed out that the proble... [more] ED2014-80 CPM2014-137 LQE2014-108
pp.33-38
MRIS, ITE-MMS 2014-07-17
13:25
Tokyo Tokyo Institute of Technology Fabrication of ultra-high density nanodot arrays with high coercivity based on analysis of initial deposition process
Hiroki Hagiwara, Siggi Wodarz, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2014-9
We have attempted to fabricate ferromagnetic nanodot arrays for bit patterned media (BPM) by using electrochemical proce... [more] MR2014-9
pp.7-10
MRIS, ITE-MMS 2013-11-15
13:25
Tokyo Waseda Univ. Characterization and analysis of deposition behavior of ultra-high density ferromagnetic nanodot arrays fabricated by electrochemical processes
Siggi Wodarz, Yuta Maniwa, Hiroki Hagiwara, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2013-20
We fabricated hcp-Co80Pt20 and L10-FePt thin films and nanodot arrays onto hcp-Ru (002) / Si substrate by electrodeposit... [more] MR2013-20
pp.7-10
SDM 2011-12-16
14:00
Nara NAIST Fabrication of 2D Photonic-Crystal by ZnO using Gel-Nanoimprint Process
Min Zhang, Shinji Araki, Li Lu, Masahiro Horita, Takashi Nishida, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) SDM2011-140
In this research, 2D-photonic-crystal ZnO films were fabricated using sol-gel spin-coating and nanoimprint lithography (... [more] SDM2011-140
pp.43-46
OPE, OME 2011-11-18
15:00
Tokyo Kikai-Shinko-Kaikan Bldg. Dependence of normalized period on fundamental optical properties of periodic-structure-imprinted polymeric films
Masaya Nishi (Nagaoka Univ. of Tech.), Makoto Okada, Shinji Matsui, Nobuhiro Kawatsuki (Univ. of Hyogo), Hiroshi Ono (Nagaoka Univ. of Tech.) OME2011-62 OPE2011-137
One of the recent intense interests in nanoimprinting technologies stems from potential ability to easily fabricate the ... [more] OME2011-62 OPE2011-137
pp.25-30
OPE, OME 2011-11-18
15:25
Tokyo Kikai-Shinko-Kaikan Bldg. Fabrication of Step-Edge Vertical Channel Organic Field-Effect Transistors Using Nanoimprint Lithography
Masahiro Fukiyama, Hiroshi Yamauchi, Masaaki Iizuka, Masatoshi Sakai, Kazuhiro Kudo (Chiba Univ.) OME2011-63 OPE2011-138
The reduction of channel length is one of the effective approaches to achieve the low operation voltage and large curren... [more] OME2011-63 OPE2011-138
pp.31-36
OME 2010-10-22
14:40
Tokyo NTT Musashino R&D Center Detachment properties of fluorinated hydrocarbon containing adsorbed monolayers on a radical-type UV-cured resin
Akihiro Kohno, Masaru Nakagawa (Tohoku Univ.) OME2010-50
Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydro-
octyl)trime... [more]
OME2010-50
pp.21-25
ED, LQE, CPM 2009-11-19
18:00
Tokushima Univ. of Tokushima (Josanjima Campus, Kogyo-Kaikan) GaN Photodetector with Nanostructure on Surface
Jing Zhang, Yoshiki Naoi, Shiro Sakai (Univ. of Tokushima), Atsuyuki Fukano, Satoru Tanaka (SCIVAX) ED2009-146 CPM2009-120 LQE2009-125
Conventional photodetector can detect intensity of incident light by voltage or current, but it is not intensive to the ... [more] ED2009-146 CPM2009-120 LQE2009-125
pp.85-89
 Results 1 - 13 of 13  /   
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