Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2023-10-13 13:00 |
Miyagi |
Niche, Tohoku Univ. |
[Invited Talk]
Defect Reduction in UV Nanoimprint Lithography Toshiki ITO (Canon) SDM2023-54 |
Field-by-field type UV nanoimprint lithography equipped with on-demand inkjet dispense system has been developed, which ... [more] |
SDM2023-54 pp.1-6 |
CPM, LQE, ED |
2019-11-22 10:00 |
Shizuoka |
Shizuoka Univ. (Hamamatsu) |
Experimental study on the antireflection nanotexture for organic photovoltaics Kenta Hiraga, Shigeru Kubota, Kensaku Kanomata, Bashir Ahmmad (Yamagata Univ.), Jun Mizuno (Waseda Univ.), Fumihiko Hirose (Yamagata Univ.) ED2019-48 CPM2019-67 LQE2019-91 |
Organic solar cells have attracted a lot of attention as the energy supply devices for near future, because they have su... [more] |
ED2019-48 CPM2019-67 LQE2019-91 pp.65-68 |
SDM, EID |
2017-12-22 10:30 |
Kyoto |
Kyoto University |
Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell Nakai Yuya, Ishikawa Yasuaki, Uraoka Yukiharu (NAIST) EID2017-11 SDM2017-72 |
For the purpose of the realization of thin-type crystal silicon solar cells, a light trapping effect in a light absorpti... [more] |
EID2017-11 SDM2017-72 pp.1-4 |
ICD |
2017-04-20 13:00 |
Tokyo |
|
[Invited Talk]
Study on Nano-Dot Structure Permanent Memory Tsuyoshi Watanabe, Noriyuki Miura, Shijia Liu, Shigeki Imai, Makoto Nagata (Kobe Univ.) ICD2017-4 |
We propose a permanent digital memory system in which data is saved by a presence of metal nano-dot at interconnects of ... [more] |
ICD2017-4 pp.17-22 |
ED, SDM |
2017-02-24 10:50 |
Hokkaido |
Centennial Hall, Hokkaido Univ. |
Fabrication of Zinc Oxide-based Thin Films Transistors by a Solution Process and a Direct Patterning of Oxide Thin Films by a Thermal Nanoimprint Method Fumiya Kimura, Alhanaki Abdullah, Yi Sun, Shota Sasaki, Koki Nagayama, Masatoshi Koyama, Toshihiko Maemoto, Shigehiko Sasa (OIT) ED2016-132 SDM2016-149 |
Zinc oxide (ZnO) is transparent semiconductor material in visible light wavelength because it has band gap energy of 3.3... [more] |
ED2016-132 SDM2016-149 pp.13-16 |
LQE, ED, CPM |
2014-11-27 14:30 |
Osaka |
|
Two-Dimensional Strain Mapping of GaN Templates Fabricated by Nano-Channel FIELO Method Using Nanoimprint Lithography Masanori Nambu, Atsushi Yamaguchi (Kanazawa Inst. of Tech.), Hiroki Goto, Haruo Sunakawa, Toshiharu Matsueda (Furukawa Co. Ltd.), Akiko Okada (Waseda Univ.), Hidetoshi Shinohara, Hiroshi Goto (Toshiba Machine Co. Ltd.), Jun Mizuno (Waseda Univ.), Akira Usui (Furukawa Co. Ltd.) ED2014-80 CPM2014-137 LQE2014-108 |
The efficiency droop phenomenon is a big problem for high-brightness white LEDs. It has been pointed out that the proble... [more] |
ED2014-80 CPM2014-137 LQE2014-108 pp.33-38 |
MRIS, ITE-MMS |
2014-07-17 13:25 |
Tokyo |
Tokyo Institute of Technology |
Fabrication of ultra-high density nanodot arrays with high coercivity based on analysis of initial deposition process Hiroki Hagiwara, Siggi Wodarz, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2014-9 |
We have attempted to fabricate ferromagnetic nanodot arrays for bit patterned media (BPM) by using electrochemical proce... [more] |
MR2014-9 pp.7-10 |
MRIS, ITE-MMS |
2013-11-15 13:25 |
Tokyo |
Waseda Univ. |
Characterization and analysis of deposition behavior of ultra-high density ferromagnetic nanodot arrays fabricated by electrochemical processes Siggi Wodarz, Yuta Maniwa, Hiroki Hagiwara, Tomohiro Otani, Daiki Nishiie (Waseda Univ.), Giovanni Zangari (UVA), Takayuki Homma (Waseda Univ.) MR2013-20 |
We fabricated hcp-Co80Pt20 and L10-FePt thin films and nanodot arrays onto hcp-Ru (002) / Si substrate by electrodeposit... [more] |
MR2013-20 pp.7-10 |
SDM |
2011-12-16 14:00 |
Nara |
NAIST |
Fabrication of 2D Photonic-Crystal by ZnO using Gel-Nanoimprint Process Min Zhang, Shinji Araki, Li Lu, Masahiro Horita, Takashi Nishida, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) SDM2011-140 |
In this research, 2D-photonic-crystal ZnO films were fabricated using sol-gel spin-coating and nanoimprint lithography (... [more] |
SDM2011-140 pp.43-46 |
OPE, OME |
2011-11-18 15:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Dependence of normalized period on fundamental optical properties of periodic-structure-imprinted polymeric films Masaya Nishi (Nagaoka Univ. of Tech.), Makoto Okada, Shinji Matsui, Nobuhiro Kawatsuki (Univ. of Hyogo), Hiroshi Ono (Nagaoka Univ. of Tech.) OME2011-62 OPE2011-137 |
One of the recent intense interests in nanoimprinting technologies stems from potential ability to easily fabricate the ... [more] |
OME2011-62 OPE2011-137 pp.25-30 |
OPE, OME |
2011-11-18 15:25 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Fabrication of Step-Edge Vertical Channel Organic Field-Effect Transistors Using Nanoimprint Lithography Masahiro Fukiyama, Hiroshi Yamauchi, Masaaki Iizuka, Masatoshi Sakai, Kazuhiro Kudo (Chiba Univ.) OME2011-63 OPE2011-138 |
The reduction of channel length is one of the effective approaches to achieve the low operation voltage and large curren... [more] |
OME2011-63 OPE2011-138 pp.31-36 |
OME |
2010-10-22 14:40 |
Tokyo |
NTT Musashino R&D Center |
Detachment properties of fluorinated hydrocarbon containing adsorbed monolayers on a radical-type UV-cured resin Akihiro Kohno, Masaru Nakagawa (Tohoku Univ.) OME2010-50 |
Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydro-
octyl)trime... [more] |
OME2010-50 pp.21-25 |
ED, LQE, CPM |
2009-11-19 18:00 |
Tokushima |
Univ. of Tokushima (Josanjima Campus, Kogyo-Kaikan) |
GaN Photodetector with Nanostructure on Surface Jing Zhang, Yoshiki Naoi, Shiro Sakai (Univ. of Tokushima), Atsuyuki Fukano, Satoru Tanaka (SCIVAX) ED2009-146 CPM2009-120 LQE2009-125 |
Conventional photodetector can detect intensity of incident light by voltage or current, but it is not intensive to the ... [more] |
ED2009-146 CPM2009-120 LQE2009-125 pp.85-89 |