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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| HWS, VLD [detail] | 2020-03-04 16:00 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA)  VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] | VLD2019-105 HWS2019-78 pp.65-70 |
| HWS, VLD [detail] | 2020-03-04 16:50 |
Okinawa | Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.) VLD2019-107 HWS2019-80 |
In lithography, a circuit pattern that is highly likely to cause an undesired open- and short-circuit after transfer is ... [more] | VLD2019-107 HWS2019-80 pp.77-82 |
| VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 15:45 |
Ehime | Ehime Prefecture Gender Equality Center | Lithography Hotspot Detection Based on Feature Vectors Considering Wire Width and Distance Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi (Hiroshima City Univ.) VLD2019-51 DC2019-75 |
In lithography, which is one of the semiconductor manufacturing processes, there is a pattern that is highly likely to c... [more] | VLD2019-51 DC2019-75 pp.185-190 |
| VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2018-12-07 14:10 |
Hiroshima | Satellite Campus Hiroshima | Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56 |
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in ... [more] | VLD2018-70 DC2018-56 pp.209-214 |
| VLD, IPSJ-SLDM | 2018-05-16 15:50 |
Fukuoka | Kitakyushu International Conference Center | Pixel-based OPC using Quadratic Programming for Mask Optimization Rina Azuma, Yukihide Kohira (Univ. of Aizu) VLD2018-3 |
Due to continuous shrinking of Critical Dimensions (CD) in semiconductor manufacturing, advance of process technology in... [more] | VLD2018-3 pp.31-36 |
| SDM, EID | 2017-12-22 10:30 |
Kyoto | Kyoto University | Light trapping effect of nanoimprinted texture for thin crystalline silicon solar cell Nakai Yuya, Ishikawa Yasuaki, Uraoka Yukiharu (NAIST) EID2017-11 SDM2017-72 |
For the purpose of the realization of thin-type crystal silicon solar cells, a light trapping effect in a light absorpti... [more] | EID2017-11 SDM2017-72 pp.1-4 |
| VLD, DC, CPSY, RECONF, CPM, ICD, IE (Joint) [detail] |
2016-11-29 10:30 |
Osaka | Ritsumeikan University, Osaka Ibaraki Campus | Accurate Lithography Simulation Model based on Deep Learning Yuki Watanabe, Tetsuaki Matsunawa, Taiki Kimura, Shigeki Nojima (Toshiba) VLD2016-56 DC2016-50 |
Lithography simulation is an indispensable technology for today's semiconductor manufacturing processes. To achieve accu... [more] | VLD2016-56 DC2016-50 pp.73-78 |
| VLD | 2015-03-02 13:00 |
Okinawa | Okinawa Seinen Kaikan | A Fast Lithographic Mask Correction Algorithm Ahmd Awad, Atsushi Takahashi (Tokyo Institute of Technology) VLD2014-153 |
As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity Correction (OP... [more] |
VLD2014-153 pp.1-6 |
| ED | 2011-10-20 16:45 |
Aomori | Study on the electron gun for Micro-Column Electron Beam Takahiro Fujino, Akifumi Koike (RIE Shizuoka Univ), Masayoshi Nagao, Tomoya Yoshida, Takashi Nishi (AIST), Hidekazu Murata, Kentaro Sakai (Meijo Univ), Yoichiro Neo, Toru Aoki, Hidenori Mimura (RIE Shizuoka Univ) ED2011-65 |
Our final goal is to fabricate truly meaning micro-column, that consists of micro-sized field emitter and electro optics... [more] | ED2011-65 pp.27-32 |
|
| SDM, ED | 2009-02-26 15:40 |
Hokkaido | Hokkaido Univ. | Feild Emitter Arrays with focusing function and it's applications Yoichiro Neo, Masafumi Takeda, Tomoya Tagami, Syun Horie, Toru Aoki, Hidenori Mimura (Shizuoka Univ.), Tomoya Yoshida, Masayoshi Nagao, Seigo Kanemaru (National Inst.of Adv Ind Scie and Tech.) ED2008-228 SDM2008-220 |
We have developed field emission array (FEA) with new focusing electrode structure and proposed several devices and appl... [more] | ED2008-228 SDM2008-220 pp.23-27 |
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