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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| SDM, OME | 2021-04-23 14:20 |
Okinawa | Okinawaken Seinen Kaikan (Primary: On-site, Secondary: Online) |
Issue of crystallization for LTPS TFT Noguchi Takashi, OkadaTatsuya (Univ. Ryukyus)  SDM2021-3 OME2021-3 |
Abstract Currently, poly Si TFTs are mounted on glass and are adopted for display panel s such as smart-phone, elect... [more] |
SDM2021-3 OME2021-3 pp.13-14 |
| SDM, OME | 2020-04-13 14:50 |
Okinawa | Okinawaken Seinen Kaikan (Cancelled, technical report was not issued) |
Issues for crystallization of SI films Noguchi Takashi, Okada Tatsuya (Univ. Ryukyus) |
(To be available after the conference date) [more] | |
| VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM (Joint) [detail] |
2014-11-27 14:45 |
Oita | B-ConPlaza | [Invited Talk]
Latest Development and Future Prospect of Mobile Display Technology Yoshiharu Nakajima (JDI) VLD2014-93 CPM2014-123 ICD2014-66 CPSY2014-78 DC2014-47 RECONF2014-41 |
Together with wide spread of mobile phone and smart phone, mobile display technology is developing for high resolution, ... [more] | VLD2014-93 CPM2014-123 ICD2014-66 CPSY2014-78 DC2014-47 RECONF2014-41 pp.145-148(VLD), pp.5-8(CPM), pp.5-8(ICD), pp.35-38(CPSY), pp.145-148(DC), pp.41-44(RECONF) |
| SDM | 2013-12-13 11:40 |
Nara | NAIST | Low-Temprature CLC Poly-Si TFTs with Sputtered Al2O3 Gate Dielectric Layer Tatsuya Meguro, Akito Hara (Tohoku Gakuin Univ.) SDM2013-124 |
A high-k gate dielectric is a technology booster for enhancing the performance of low-temperature (LT) polycrystalline-s... [more] | SDM2013-124 pp.49-53 |
| SDM, ED (Workshop) |
2012-06-27 17:30 |
Okinawa | Okinawa Seinen-kaikan | Characterization of Optimized Sputtered Poly-Si Films by Blue-Multi-Laser-Diode Annealing for High Performance Displays Takuma Nishinohara, J. D. Mugiraneza, Katsuya Shirai, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus) |
As a result of Blue-Multi-Laser-Diode Annealing (BLDA) for phosphorus-doped Si films deposited by R.F. sputtering using ... [more] | |
| ITE-IDY, EID | 2011-11-29 11:00 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Report IMID (TFTs etc.) Takashi Noguchi (Univ. Ryukyus) |
[more] | |
| ITE-IDY, EID | 2010-07-16 10:20 |
Tokyo | Kikai-Shinko-Kaikan Bldg. | Report on SID'10
-- Active Matrix Devices-I -- Tohru Nishibe (Toshiba Mobile Display Co., Ltd,) EID2010-8 |
I'll report on the subtitle"Active-Matrix Devices-I" of SID'10. Involved papers are as follows. Session 4: Active-Mat... [more] |
EID2010-8 pp.3-6 |
| SDM, OME | 2008-04-11 11:25 |
Okinawa | Okinawa Seinen Kaikan | Evaluation of stress and crystallinity of laser crystallization polysilicon thin film using UV/Visible Raman spectroscopy Yasuto Kakemura, Daisuke Kosemura, Atsushi Ogura (Meiji Univ.), Takashi Noguchi (Univ. of the Ryukyus) SDM2008-6 OME2008-6 |
Low temperature polysilicon (LTPS) thin film is a key material for the systems-on-glass achievement. Depth and in-plane ... [more] | SDM2008-6 OME2008-6 pp.27-32 |
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