Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
CPM, ED, LQE |
2022-11-24 11:35 |
Aichi |
Winc Aichi (Aichi Industry & Labor Center) (Primary: On-site, Secondary: Online) |
Semiconducting properties of electrochemically deposited Ni(OH)2 thin films Masahide Shimura, Koji Abe (Nitech) ED2022-28 CPM2022-53 LQE2022-61 |
Abstract Metal hydroxides are important inorganic materials used as flame retardants and precursors for metal oxide syn... [more] |
ED2022-28 CPM2022-53 LQE2022-61 pp.23-26 |
OME |
2022-03-26 13:50 |
Tokyo |
Seikei Univ, (Primary: On-site, Secondary: Online) |
Ammonia electrosynthesis at low temperatures and atmospheric pressure using Ru/TiO2/CP electrode prepared by electrodeposition Ryuto Konno, Hidenobu Shiroishi (NIT, Tokyo College), Mika Shiraishi, Mikka Nishitani-Gamo (Toyo Univ.) OME2021-67 |
The development of a highly active electrochemical nitrogen reduction catalyst for low temperatures and atmospheric pres... [more] |
OME2021-67 pp.5-8 |
ED, LQE, CPM |
2018-11-29 16:30 |
Aichi |
Nagoya Inst. tech. |
Fabrication of FeSxOy thin film by tartaric acid added three-step pulse electrochemical deposition and fabrication of ZnO/FeSxOy heterojunction solar cell Wen Ji, Masaya Ichimura (NIT) ED2018-40 CPM2018-74 LQE2018-94 |
FeS2 is a p-type semiconductor with a narrow band gap and thus is regarded as a good absorber in a heterojunction solar ... [more] |
ED2018-40 CPM2018-74 LQE2018-94 pp.35-39 |
ED, LQE, CPM |
2018-11-30 10:50 |
Aichi |
Nagoya Inst. tech. |
Fabrication of p-NiO/n-ZnO transparent solar cells by electrochemical deposition Miki Koyama, Masaya Ichimura (NIT) ED2018-45 CPM2018-79 LQE2018-99 |
Because of reported optical transparency and photovoltaic generation, an application of NiO/ZnO pn-junctions can be expe... [more] |
ED2018-45 CPM2018-79 LQE2018-99 pp.61-64 |
ED, CPM, SDM |
2018-05-24 13:55 |
Aichi |
Toyohashi Univ. of Tech. (VBL) |
Fabrication of Cu-O Thin Films by Galvanostatic Electrochemical Deposition from Weakly Acidic Solutions mansoureh keikhaei, Masaya Ichimura (NIT) ED2018-15 CPM2018-2 SDM2018-10 |
Cu-O thin films are deposited at low pH (< 6), low and high temperatures (10?C and 60?C) using the cathodic electrochemi... [more] |
ED2018-15 CPM2018-2 SDM2018-10 pp.5-10 |
ED, CPM, SDM |
2015-05-29 11:45 |
Aichi |
Venture Business Laboratory, Toyohashi University of Technology |
Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO Takahiro Kajima (Nagoya Inst. of Tech.), Shoichi Kawai (DENSO CORP.), Masaya Ichimura (Nagoya Inst. of Tech.) ED2015-34 CPM2015-19 SDM2015-36 |
The electrochemical deposition (ECD) is a method to deposit thin films by reducing ions in an aqueous solution. FeS2 (py... [more] |
ED2015-34 CPM2015-19 SDM2015-36 pp.91-95 |
CPM, ED, SDM |
2014-05-29 15:35 |
Aichi |
|
Fabrication of SnS thin film by the light-assisted electrochemical deposition method and application to CdS/SnS heterojunction cells Yoshikazu Tanaka, Masaya Ichimura (NIT) ED2014-44 CPM2014-27 SDM2014-42 |
By using the electrochemical deposition (ECD) method, many kinds of sulfide semiconductors can be fabricated using thios... [more] |
ED2014-44 CPM2014-27 SDM2014-42 pp.129-134 |
OME |
2013-03-05 17:35 |
Saga |
AIST Kyushu Center |
Surface measurements for surface treatment and corrosion process Rui Inoue, Shunsuke Abe, Kohei Ito, Akira Sunahara, Ryouji Suzuki, Youhei Hirohata, Kazuhiko Noda (Shibaura Inst. of Tech.) OME2012-104 |
Suitable electrochemical measurement method is crucial to analyze film formation process in surface treatment such as el... [more] |
OME2012-104 pp.61-65 |
ED, SDM, CPM |
2012-05-18 13:25 |
Aichi |
VBL, Toyohashi Univ. of Technol. |
Electrodeposition of Ga2O3 Thin Films from Aqueous Gallium Sulfate Solutions Junie Jhon M. Vequizo, Masaya Ichimura (Nagoya Inst. of Tech.) ED2012-34 CPM2012-18 SDM2012-36 |
Gallium oxide (Ga2O3) thin films were prepared by employing facile electrodeposition technique from aqueous gallium sulf... [more] |
ED2012-34 CPM2012-18 SDM2012-36 pp.85-89 |
CPM, SDM, ED |
2011-05-19 09:00 |
Aichi |
Nagoya Univ. (VBL) |
Fabration of CuxS and CuxZnyS thin films by the electrochemical deposition method Kai Yang, Yuki Nakashima, Masaya Ichimura (NIT) ED2011-1 CPM2011-8 SDM2011-14 |
CuxS thin films were deposited by the electrochemical deposition (ECD) method on indium-tin oxide-coated (ITO) glass sub... [more] |
ED2011-1 CPM2011-8 SDM2011-14 pp.1-6 |
CPM, SDM, ED |
2011-05-20 15:15 |
Aichi |
Nagoya Univ. (VBL) |
A tandem photo electrochemical solar cell by SnS and ZnO thin films. Shou Hattori, Masaya Ichimura (Nagoya Inst. Technol.) ED2011-31 CPM2011-38 SDM2011-44 |
A tandem photo electrochemical solar cell(T-PEC cell) is a wet solar cell which uses photo reaction at interfaces betwee... [more] |
ED2011-31 CPM2011-38 SDM2011-44 pp.157-162 |
ED, CPM, SDM |
2009-05-14 15:50 |
Aichi |
Satellite Office, Toyohashi Univ. of Technology |
A proposal for Highly Transparent Chalcogenide Alloys for Thin-Film-Solar-Cell Applications Asraf M. Abdel Haleem, Masaya Ichimura (Nagoya Inst. of Tech.) ED2009-23 CPM2009-13 SDM2009-13 |
Gallium-Indium-sulfide-oxide thin films were deposited onto F-doped SnO2-coated glass by electrochemical deposition from... [more] |
ED2009-23 CPM2009-13 SDM2009-13 pp.25-30 |
MRIS, ITE-MMS |
2008-11-21 15:35 |
Tokyo |
Waseda University |
[Invited Talk]
Development of Electrochemical Technique to Prepare Soft Magnetic Films with High Saturation Magnetic Flux Density and Their Practical Applications Tetsuya Osaka (Waseda Univ.) MR2008-33 |
Magnetic materials are classed as 'soft' if they have a low coercivity. Soft magnetic materials are a central component ... [more] |
MR2008-33 pp.19-24 |
SDM, ED |
2008-07-11 15:50 |
Hokkaido |
Kaderu2・7 |
Electrochemical Formation and Functionalization of InP Porous Nanostructures and Their Application to Chemical Sensors Akinori Mizohata, Naoki Yoshizawa, Taketomo Sato, Tamotsu Hashizume (Hokkaido Univ.) ED2008-102 SDM2008-121 |
We investigated the electrocatalytic activity of n-type InP porous nanostructures and the feasibility of their functiona... [more] |
ED2008-102 SDM2008-121 pp.327-330 |
SDM, ED |
2008-07-11 15:35 |
Hokkaido |
Kaderu2・7 |
Observation of Regions with Low Schottky Barrier Height in 4H-SiC by the Electrochemical Deposition Masashi Kato, Hidenori Ono, Kazuya Ogawa, Masaya Ichimura (Nagoya Inst. of Tech.) ED2008-108 SDM2008-127 |
4H-SiC Schottky diodes are promising devices for the application of high-power and high-frequency rectifiers.However it ... [more] |
ED2008-108 SDM2008-127 pp.357-361 |
CPM, ED, SDM |
2008-05-16 14:40 |
Aichi |
Nagoya Institute of Technology |
Observation Method of Variation in Barrier Height in 4H-SiC Schottky Diodes Using the Electrochemical Deposition Hidenori Ono, Kazuya Ogawa, Masashi Kato, Masaya Ichimura (Nagoya Inst. of Tech.) ED2008-19 CPM2008-27 SDM2008-39 |
4H-SiC Schottky Diodes are promising for application of high-power and high-frequency rectifiers.However it is reported... [more] |
ED2008-19 CPM2008-27 SDM2008-39 pp.89-94 |
SDM, ED, CPM |
2007-05-25 10:20 |
Shizuoka |
Shizuoka Univ. |
Fabrication of SnO2 thin films by the electrochemical deposition method Wang Jun, Masaya Ichimura (Nagoya Inst. of Tech.) |
Abstract The electrochemical deposition (ECD) method is promising for producing solar cells at low cost. We deposited S... [more] |
|
SDM, ED, CPM |
2007-05-25 13:30 |
Shizuoka |
Shizuoka Univ. |
Electrochemical deposition of indium sulfide thin films by periodic pulse-form biasing and their characterization Ashraf Mohamed Abdel Haleem, Masaya Ichimura (Nagoya Inst. Technol.) |
In this study, indium sulfide oxide (InSxOy) was deposited onto ITO coated glass substrate by electrochemical deposition... [more] |
|