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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 18 of 18  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM, ED, LQE 2022-11-24
11:35
Aichi Winc Aichi (Aichi Industry & Labor Center)
(Primary: On-site, Secondary: Online)
Semiconducting properties of electrochemically deposited Ni(OH)2 thin films
Masahide Shimura, Koji Abe (Nitech) ED2022-28 CPM2022-53 LQE2022-61
Abstract Metal hydroxides are important inorganic materials used as flame retardants and precursors for metal oxide syn... [more] ED2022-28 CPM2022-53 LQE2022-61
pp.23-26
OME 2022-03-26
13:50
Tokyo Seikei Univ,
(Primary: On-site, Secondary: Online)
Ammonia electrosynthesis at low temperatures and atmospheric pressure using Ru/TiO2/CP electrode prepared by electrodeposition
Ryuto Konno, Hidenobu Shiroishi (NIT, Tokyo College), Mika Shiraishi, Mikka Nishitani-Gamo (Toyo Univ.) OME2021-67
The development of a highly active electrochemical nitrogen reduction catalyst for low temperatures and atmospheric pres... [more] OME2021-67
pp.5-8
ED, LQE, CPM 2018-11-29
16:30
Aichi Nagoya Inst. tech. Fabrication of FeSxOy thin film by tartaric acid added three-step pulse electrochemical deposition and fabrication of ZnO/FeSxOy heterojunction solar cell
Wen Ji, Masaya Ichimura (NIT) ED2018-40 CPM2018-74 LQE2018-94
FeS2 is a p-type semiconductor with a narrow band gap and thus is regarded as a good absorber in a heterojunction solar ... [more] ED2018-40 CPM2018-74 LQE2018-94
pp.35-39
ED, LQE, CPM 2018-11-30
10:50
Aichi Nagoya Inst. tech. Fabrication of p-NiO/n-ZnO transparent solar cells by electrochemical deposition
Miki Koyama, Masaya Ichimura (NIT) ED2018-45 CPM2018-79 LQE2018-99
Because of reported optical transparency and photovoltaic generation, an application of NiO/ZnO pn-junctions can be expe... [more] ED2018-45 CPM2018-79 LQE2018-99
pp.61-64
ED, CPM, SDM 2018-05-24
13:55
Aichi Toyohashi Univ. of Tech. (VBL) Fabrication of Cu-O Thin Films by Galvanostatic Electrochemical Deposition from Weakly Acidic Solutions
mansoureh keikhaei, Masaya Ichimura (NIT) ED2018-15 CPM2018-2 SDM2018-10
Cu-O thin films are deposited at low pH (< 6), low and high temperatures (10?C and 60?C) using the cathodic electrochemi... [more] ED2018-15 CPM2018-2 SDM2018-10
pp.5-10
ED, CPM, SDM 2015-05-29
11:45
Aichi Venture Business Laboratory, Toyohashi University of Technology Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO
Takahiro Kajima (Nagoya Inst. of Tech.), Shoichi Kawai (DENSO CORP.), Masaya Ichimura (Nagoya Inst. of Tech.) ED2015-34 CPM2015-19 SDM2015-36
The electrochemical deposition (ECD) is a method to deposit thin films by reducing ions in an aqueous solution. FeS2 (py... [more] ED2015-34 CPM2015-19 SDM2015-36
pp.91-95
CPM, ED, SDM 2014-05-29
15:35
Aichi   Fabrication of SnS thin film by the light-assisted electrochemical deposition method and application to CdS/SnS heterojunction cells
Yoshikazu Tanaka, Masaya Ichimura (NIT) ED2014-44 CPM2014-27 SDM2014-42
By using the electrochemical deposition (ECD) method, many kinds of sulfide semiconductors can be fabricated using thios... [more] ED2014-44 CPM2014-27 SDM2014-42
pp.129-134
OME 2013-03-05
17:35
Saga AIST Kyushu Center Surface measurements for surface treatment and corrosion process
Rui Inoue, Shunsuke Abe, Kohei Ito, Akira Sunahara, Ryouji Suzuki, Youhei Hirohata, Kazuhiko Noda (Shibaura Inst. of Tech.) OME2012-104
Suitable electrochemical measurement method is crucial to analyze film formation process in surface treatment such as el... [more] OME2012-104
pp.61-65
ED, SDM, CPM 2012-05-18
13:25
Aichi VBL, Toyohashi Univ. of Technol. Electrodeposition of Ga2O3 Thin Films from Aqueous Gallium Sulfate Solutions
Junie Jhon M. Vequizo, Masaya Ichimura (Nagoya Inst. of Tech.) ED2012-34 CPM2012-18 SDM2012-36
Gallium oxide (Ga2O3) thin films were prepared by employing facile electrodeposition technique from aqueous gallium sulf... [more] ED2012-34 CPM2012-18 SDM2012-36
pp.85-89
CPM, SDM, ED 2011-05-19
09:00
Aichi Nagoya Univ. (VBL) Fabration of CuxS and CuxZnyS thin films by the electrochemical deposition method
Kai Yang, Yuki Nakashima, Masaya Ichimura (NIT) ED2011-1 CPM2011-8 SDM2011-14
CuxS thin films were deposited by the electrochemical deposition (ECD) method on indium-tin oxide-coated (ITO) glass sub... [more] ED2011-1 CPM2011-8 SDM2011-14
pp.1-6
CPM, SDM, ED 2011-05-20
15:15
Aichi Nagoya Univ. (VBL) A tandem photo electrochemical solar cell by SnS and ZnO thin films.
Shou Hattori, Masaya Ichimura (Nagoya Inst. Technol.) ED2011-31 CPM2011-38 SDM2011-44
A tandem photo electrochemical solar cell(T-PEC cell) is a wet solar cell which uses photo reaction at interfaces betwee... [more] ED2011-31 CPM2011-38 SDM2011-44
pp.157-162
ED, CPM, SDM 2009-05-14
15:50
Aichi Satellite Office, Toyohashi Univ. of Technology A proposal for Highly Transparent Chalcogenide Alloys for Thin-Film-Solar-Cell Applications
Asraf M. Abdel Haleem, Masaya Ichimura (Nagoya Inst. of Tech.) ED2009-23 CPM2009-13 SDM2009-13
Gallium-Indium-sulfide-oxide thin films were deposited onto F-doped SnO2-coated glass by electrochemical deposition from... [more] ED2009-23 CPM2009-13 SDM2009-13
pp.25-30
MRIS, ITE-MMS 2008-11-21
15:35
Tokyo Waseda University [Invited Talk] Development of Electrochemical Technique to Prepare Soft Magnetic Films with High Saturation Magnetic Flux Density and Their Practical Applications
Tetsuya Osaka (Waseda Univ.) MR2008-33
Magnetic materials are classed as 'soft' if they have a low coercivity. Soft magnetic materials are a central component ... [more] MR2008-33
pp.19-24
SDM, ED 2008-07-11
15:50
Hokkaido Kaderu2・7 Electrochemical Formation and Functionalization of InP Porous Nanostructures and Their Application to Chemical Sensors
Akinori Mizohata, Naoki Yoshizawa, Taketomo Sato, Tamotsu Hashizume (Hokkaido Univ.) ED2008-102 SDM2008-121
We investigated the electrocatalytic activity of n-type InP porous nanostructures and the feasibility of their functiona... [more] ED2008-102 SDM2008-121
pp.327-330
SDM, ED 2008-07-11
15:35
Hokkaido Kaderu2・7 Observation of Regions with Low Schottky Barrier Height in 4H-SiC by the Electrochemical Deposition
Masashi Kato, Hidenori Ono, Kazuya Ogawa, Masaya Ichimura (Nagoya Inst. of Tech.) ED2008-108 SDM2008-127
4H-SiC Schottky diodes are promising devices for the application of high-power and high-frequency rectifiers.However it ... [more] ED2008-108 SDM2008-127
pp.357-361
CPM, ED, SDM 2008-05-16
14:40
Aichi Nagoya Institute of Technology Observation Method of Variation in Barrier Height in 4H-SiC Schottky Diodes Using the Electrochemical Deposition
Hidenori Ono, Kazuya Ogawa, Masashi Kato, Masaya Ichimura (Nagoya Inst. of Tech.) ED2008-19 CPM2008-27 SDM2008-39
4H-SiC Schottky Diodes are promising for application of high-power and high-frequency rectifiers.However it is reported... [more] ED2008-19 CPM2008-27 SDM2008-39
pp.89-94
SDM, ED, CPM 2007-05-25
10:20
Shizuoka Shizuoka Univ. Fabrication of SnO2 thin films by the electrochemical deposition method
Wang Jun, Masaya Ichimura (Nagoya Inst. of Tech.)
Abstract The electrochemical deposition (ECD) method is promising for producing solar cells at low cost. We deposited S... [more]
SDM, ED, CPM 2007-05-25
13:30
Shizuoka Shizuoka Univ. Electrochemical deposition of indium sulfide thin films by periodic pulse-form biasing and their characterization
Ashraf Mohamed Abdel Haleem, Masaya Ichimura (Nagoya Inst. Technol.)
In this study, indium sulfide oxide (InSxOy) was deposited onto ITO coated glass substrate by electrochemical deposition... [more]
 Results 1 - 18 of 18  /   
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