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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
ED 2014-08-01
14:20
Tokyo Kikai-Shinko-Kaikan Bldg. B3-1 Analysis of Mechanisms of Delay Time Generation in III-V DG MOSFETs
Yuki Yajima, Ryoko Ohama, Sachie Fujikawa, Hiroki I. Fujishiro (TUS) ED2014-57
III-V semiconductors have attracted much attention as promising n-type channel materials for the future logic device to ... [more] ED2014-57
pp.25-28
SDM 2009-10-29
16:45
Miyagi Tohoku University Current Voltage Characteristics of Si-MESFET on SOI Substrate
Toshiyuki Abe, Yuichiro Tanushi, Shin-Ichiro Kuroki, Koji Kotani, Takashi Ito (Tohoku Univ.) SDM2009-122
We simulate current-voltage characteristics of scaled Si metal semiconductor field effect transistors (MESFETs) and show... [more] SDM2009-122
pp.27-30
VLD, ICD 2008-03-07
16:10
Okinawa TiRuRu New technology of independent-gate controlled Double-Gate transistor for system LSI
Yu Hiroshima, Keisuke Okamoto, Keisuke Koizumi, Shigeyoshi Watanabe (Shonan Inst. of Tech.) VLD2007-168 ICD2007-191
New design technology of independent-gate controlled Double-Gate transistor realized high density design more than FinFE... [more] VLD2007-168 ICD2007-191
pp.69-74
VLD, ICD 2008-03-07
16:35
Okinawa TiRuRu New design technology of independent-Gate controlled Stacked type 3D transistor for system LSI
Yu Hiroshima, Keisuke Okamoto, Keisuke Koizumi, Shigeyoshi Watanabe (Shonan Inst. of Tech.) VLD2007-169 ICD2007-192
New design technology of Independent-Gate controlled Stacked type 3D transistor has feature of Independent-gate controll... [more] VLD2007-169 ICD2007-192
pp.75-80
ICD, VLD 2006-03-10
16:00
Okinawa   Impact of Three-Dimensional Transistor on the pattern area reduction for ULSI
Shigeyoshi Watanabe (Shonan Inst. of Tech.)
The impact of three-dimensional transistors, double-gate transistor, FinFET, and surrounding gate transistor (SGT) on th... [more] VLD2005-133 ICD2005-250
pp.67-72
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