Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
WPT |
2024-03-15 15:00 |
Kyoto |
Kyoto-Univ. (Uji campus) (Primary: On-site, Secondary: Online) |
Design and Performance Comparison of Single-Shunt and Single-Series Rectifier Circuits Katsumi Kawai, Naoki Shinohara, Tomohiko Mitani (Kyoto Univ.) WPT2023-56 |
In the microwave power transmission system, the rectifier circuit is a crucial component. There are two types of rectifi... [more] |
WPT2023-56 pp.103-106 |
VLD, HWS, ICD |
2024-03-01 14:50 |
Okinawa |
(Primary: On-site, Secondary: Online) |
Defect Coverage Estimation by Sampling in Testing Power TSV Koutaro Hachiya, Yudai Kawakami (THU) VLD2023-129 HWS2023-89 ICD2023-118 |
As a test for power TSVs (Through Silicon Via) in 3D-IC, a method has been proposed to detect open defects by placing po... [more] |
VLD2023-129 HWS2023-89 ICD2023-118 pp.157-160 |
SDM |
2023-10-13 13:00 |
Miyagi |
Niche, Tohoku Univ. |
[Invited Talk]
Defect Reduction in UV Nanoimprint Lithography Toshiki ITO (Canon) SDM2023-54 |
Field-by-field type UV nanoimprint lithography equipped with on-demand inkjet dispense system has been developed, which ... [more] |
SDM2023-54 pp.1-6 |
CPM |
2023-08-01 10:40 |
Hokkaido |
(Primary: On-site, Secondary: Online) |
Review of Characterization of Metal/GaN Schottky Contacts Kenji Shiojima (Univ. of Fukui) CPM2023-21 |
This paper reviews innovation of metal/GaN contacts from the aspects of crystal quality, process technique, and basic un... [more] |
CPM2023-21 pp.36-39 |
MW |
2023-05-18 15:10 |
Kyoto |
Ritsumeikan University (Primary: On-site, Secondary: Online) |
A design method for miniaturized multiplexer based on a novel substrate integrated defect ground structure Weiyu Zhou, Koji Wada (UEC), Kenichi Ohta (Bifröstec Inc.) MW2023-10 |
This paper proposes a new structure based on a substrate integrated defect ground structure (SIDGS), and a miniaturized ... [more] |
MW2023-10 pp.6-11 |
SS |
2023-03-15 11:00 |
Okinawa |
(Primary: On-site, Secondary: Online) |
Investigation of software development history using a configuration management tool for defect prediction Takayuki Zukawa (Kyoto Inst. Tech.), Masanari Kondo (Kyushu Univ.), Eunjong Choi, Osamu Mizuno (Kyoto Inst. Tech.) SS2022-64 |
As software becomes more widely used, Infrastructure as Code (IaC) is becoming increasingly popular for eliminating the ... [more] |
SS2022-64 pp.103-108 |
ET |
2023-03-15 14:00 |
Tokushima |
Tokushima University (Primary: On-site, Secondary: Online) |
Methods for Estimating Problematic Parts in Presentations Based on Analysis of Slide Data and Audiences' Unconscious Responses Ko Saito (Fukushima Univ.), Hiroki Nakayama (Yamagata Univ.), Ryo Onuma (Tsuda Univ.), Hiroaki Kaminaga (Fukushima Univ.), Youzou Miyadera (Tokyo Gakugei Univ.), Shoichi Nakamura (Fukushima Univ.) ET2022-88 |
Presentation is one of the important means of explaining the results and progress of creative works. Particularly, prese... [more] |
ET2022-88 pp.178-183 |
PRMU, IBISML, IPSJ-CVIM [detail] |
2023-03-03 17:00 |
Hokkaido |
Future University Hakodate (Primary: On-site, Secondary: Online) |
Explainable Deep Clustering for Wafer Defect Pattern Classification Yuki Okazaki, Hiroki Takahashi (The Univ. of Electro-Communications) PRMU2022-115 IBISML2022-122 |
Classification of specific defect patterns on semiconductor wafers is important in manufacturing processes. Recently, ma... [more] |
PRMU2022-115 IBISML2022-122 pp.299-304 |
DC |
2023-02-28 16:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg (Primary: On-site, Secondary: Online) |
A Novel High Performance Scan-Test-Aware Hardened Latch with Improved Soft Error Tolerability Ruijun Ma (AUST), Stefan Holst, Xiaoqing Wen (KIT), Hui Xu (AUST), Aibin Yan (AU) DC2022-91 |
The continuous pursuing of smaller technology nodes makes modern Integrated Circuits (ICs) more and more susceptible to ... [more] |
DC2022-91 pp.51-55 |
ICTSSL, CAS |
2023-01-27 16:00 |
Tokyo |
TBD (Primary: On-site, Secondary: Online) |
Ultrawideband Absorptive Common-mode Microstrip Line Filter Based on Resistive Defected Ground Structure Akihiro Narushima, Koji Wada, Fengchao Xiao (UEC) CAS2022-92 ICTSSL2022-56 |
In this study, we propose a bidirectional absorptive common-mode filter(A-CMF) with ultrawideband characteristics by usi... [more] |
CAS2022-92 ICTSSL2022-56 pp.145-150 |
OME, IEE-DEI |
2023-01-18 14:45 |
Aichi |
Aichi Himaka island ホテル浦島 |
[Invited Talk]
Research trend of Tin based perovskite solar cell
-- From Lead free perovskite solar cell to all perovskite tandem solar cells -- Shuzi Hayase (UEC) OME2022-64 |
The certified efficiency of the lead halide perovskite solar cell (Pb-PVK PV) is now 25.7 %, which is close to that of s... [more] |
OME2022-64 pp.4-7 |
DC |
2022-12-16 13:10 |
Yamaguchi |
(Primary: On-site, Secondary: Online) |
On Improving the Accuracy of LSI Small Delay Fault Diagnosis Shinnosuke Fujita, Stefan Holst, Xiaoqing Wen (Kyutech) DC2022-72 |
With today's tight timing margins, increasing manufacturing variation, and the development of nanometer technology, timi... [more] |
DC2022-72 pp.1-6 |
WPT (2nd) |
2022-12-05 - 2022-12-06 |
Kyoto |
Uji Obaku Plaza Kihada Hall, Uji Campus, Kyoto University (Primary: On-site, Secondary: Online) |
Design of Low Efficiency Variation 5G Rectifier without External Matching Circuits Babita Gyawali (Kyushu Univ.), Mohamed Aboualalaa (Electronics Research Institute), Adel Barakat, Ramesh K. Pokharel (Kyushu Univ.) |
A self-impedance matching which reduces the circuit size and losses is proposed for a 5G rectifier by using a voltage do... [more] |
|
EMCJ, MW, EST, IEE-EMC [detail] |
2022-10-14 10:50 |
Akita |
Akita University (Primary: On-site, Secondary: Online) |
A Study on Planar Metallic Photonic Crystal Resonators Jiaxing FAN, Chunping Chen, Liangchao JIang, Ming Wang, Takaharu Hiraoka, Tetsuo Anada (Kanagawa Univ) EMCJ2022-55 MW2022-101 EST2022-65 |
In recent years, the application of planar metallic photonic crystal (MPhC) structures have been attracting a lot of att... [more] |
EMCJ2022-55 MW2022-101 EST2022-65 pp.102-107 |
EMD, R, LQE, OPE, CPM |
2022-08-25 13:35 |
Chiba |
(Primary: On-site, Secondary: Online) |
[Invited Talk]
Development of wafer quality evaluation platform for realization of high-reliable SiC power semiconductor devices Junji Senzaki (AIST) R2022-17 EMD2022-5 CPM2022-22 OPE2022-48 LQE2022-11 |
Various power supplies and inverters equipped with SiC power semiconductor devices that realize energy saving and miniat... [more] |
R2022-17 EMD2022-5 CPM2022-22 OPE2022-48 LQE2022-11 pp.7-12 |
SS, IPSJ-SE, KBSE [detail] |
2022-07-28 13:30 |
Hokkaido |
Hokkaido-Jichiro-Kaikan (Sapporo) (Primary: On-site, Secondary: Online) |
SS2022-1 KBSE2022-11 |
(To be available after the conference date) [more] |
SS2022-1 KBSE2022-11 pp.1-6 |
SS |
2022-03-07 16:45 |
Online |
Online |
Performance Evaluation of Defect Prediction using Trace Logs Issei Morita, Yutaro Kashiwa, Tsukasa Nakamura, Hiroki Yamamoto, Masanari Kondo, Yasutaka Kamei, Naoyasu Ubayashi (Kyushu Univ.) SS2021-53 |
In order to detect defects at an early stage of software development, techniques for predicting whether or not a change ... [more] |
SS2021-53 pp.66-71 |
ICTSSL, CAS |
2022-01-20 09:50 |
Online |
Online |
Classification method for painting defects using a two-step deep learning Kazune Adachi, Takahiro Natori, Naoyuki Aikawa (Tokyo Univ. of Science) CAS2021-51 ICTSSL2021-28 |
Recently, inspection methods for defect detection and classification using deep learning have been proposed. In this pap... [more] |
CAS2021-51 ICTSSL2021-28 pp.1-5 |
SDM |
2021-11-11 15:15 |
Online |
Online |
[Invited Talk]
Characterization techniques of plasma process-induced defect creation in electronic devices Koji Eriguchi (Kyoto Univ.) SDM2021-57 |
Plasma processing plays an important role in manufacturing leading-edge electronic devices. Plasma etching achieves fine... [more] |
SDM2021-57 pp.23-28 |
KBSE, SWIM |
2021-05-22 10:30 |
Online |
Online |
Feature Selection for Avoiding Overfitting of Software Defect Prediction Yuta Nagai, Ryuichi Takahashi (Ibaraki Univ.) KBSE2021-7 SWIM2021-7 |
Software defect prediction by machine learning is important for software development, and there is much research on how ... [more] |
KBSE2021-7 SWIM2021-7 pp.37-43 |