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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
HWS, VLD [detail] 2020-03-04
16:00
Okinawa Okinawa Ken Seinen Kaikan
(Cancelled but technical report was issued)
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping
Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] VLD2019-105 HWS2019-78
pp.65-70
VLD, DC, CPSY, RECONF, CPM, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC
(Joint) [detail]
2018-12-07
14:10
Hiroshima Satellite Campus Hiroshima Process Variation-aware Model-based OPC using 0-1 Quadratic Programming
Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in ... [more] VLD2018-70 DC2018-56
pp.209-214
VLD, IPSJ-SLDM 2018-05-16
15:50
Fukuoka Kitakyushu International Conference Center Pixel-based OPC using Quadratic Programming for Mask Optimization
Rina Azuma, Yukihide Kohira (Univ. of Aizu) VLD2018-3
Due to continuous shrinking of Critical Dimensions (CD) in semiconductor manufacturing, advance of process technology in... [more] VLD2018-3
pp.31-36
VLD, HWS
(Joint)
2018-03-01
09:25
Okinawa Okinawa Seinen Kaikan Efficient Generation of Lithography Hotspot Detector based on Transfer Learning
Shuhei Suzuki, Yoichi Tomioka (UoA) VLD2017-106
As semiconductor features shrink in size, the fidelity of the layout pattern transferred onto the wafer decreases. A layo... [more] VLD2017-106
pp.103-108
VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM
(Joint) [detail]
2015-12-02
14:55
Nagasaki Nagasaki Kinro Fukushi Kaikan [Invited Talk] EDA Research Activities in The University of Texas at Austin
Tetsuaki Matsunawa (Toshiba) VLD2015-50 DC2015-46
International competition in EDA research is getting more intense.
In major international conference, such as DAC or IC... [more]
VLD2015-50 DC2015-46
p.73
VLD, DC, IPSJ-SLDM, CPSY, RECONF, ICD, CPM
(Joint) [detail]
2011-11-29
17:00
Miyazaki NewWelCity Miyazaki [Keynote Address] Lithography : past, present, and future
Shigeki Nojima (Toshiba) VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49
Lithography is one of the key technologies for semiconductor device shrink. For example, wave length
becomes shorter an... [more]
VLD2011-81 CPM2011-161 ICD2011-93 CPSY2011-48 DC2011-57 RECONF2011-49
p.171(VLD), p.65(CPM), p.65(ICD), p.33(CPSY), p.171(DC), p.45(RECONF)
ICSS 2011-03-25
15:35
Tokyo Suspended Development and evaluation of PDF malware analysis system using dynamic analysis
Masaki Kamizono, Masata Nishida, Yuji Hoshizawa (Securebrain Corp.) ICSS2010-64
Several Adobe Reader zero-day vulnerabilities have been discovered recently, and the threat of PDF malware continues to ... [more] ICSS2010-64
pp.47-52
ICD 2007-04-12
14:20
Oita   A voltage scalable advanced DFM RAM with accelerated screening for low power SoC platform
Hiroki Shimano, Fukashi Morishita, Katsumi Dosaka, Kazutami Arimoto (Renesas Technology Corp.) ICD2007-8
The advanced-DFM (Design For Manufacturability) RAM provides the solution for the limitation of SRAM voltage scaling dow... [more] ICD2007-8
pp.41-46
SDM, VLD 2006-09-25
14:45
Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Talk] Report on 2006 DAC -- Low Power Design Methodology --
Shigeru Kuriyama (STARC)
We report the outline about 43rd Design Automation Conference held in San Francisco on July, 2006. We report brief summa... [more] VLD2006-37 SDM2006-158
pp.19-23
ICD, VLD 2006-03-10
14:25
Okinawa   A reconfigurable circuit to utilize and compensate device variations
Manabu Kotani, Kazuya Katsuki, Kosuke Ogata, Kazutoshi Kobayashi, Hidetoshi Onodera (Kyoto Univ.)
This paper provides the principle and architecture of a reconfigurable circuit utilizing Within-Die variaitions and sho... [more] VLD2005-130 ICD2005-247
pp.49-54
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