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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 20 of 67  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2023-11-10
14:40
Tokyo
(Primary: On-site, Secondary: Online)
[Invited Talk] Characterization of Physical Properties in GaN under High Electric Field -- Impact Ionization Coefficients and Critical Electric Field --
Takuya Maeda (UTokyo) SDM2023-72
The accurate device simulation and prediction of the safe operating region for power devices require precise values of m... [more] SDM2023-72
pp.41-46
HWS 2023-04-15
10:45
Oita
(Primary: On-site, Secondary: Online)
PUF Based on Fetal-Movement Circuit
Kotaro Naruse, Takayuki Ueda, Jun Shiomi, Yoshihiro Midoh, Noriyuki Miura (Osaka Univ.) HWS2023-12
As a yet unexploited high-energy source for powering ICs, this paper focused on high-energy plasma in a semiconductor f... [more] HWS2023-12
pp.49-50
CNR, BioX 2023-03-01
10:00
Oita
(Primary: On-site, Secondary: Online)
Design and Implementation of a Dialogue Breakdown Avoidance Method Using Excuses in a Chat Dialogue System
Ryusei Ogasawara, Yuki Furuya, Kazunori Takashio (Keio Univ.) BioX2022-63 CNR2022-29
In order to achieve natural dialogue with a dialogue system, it is necessary to resolve dialogue breakdowns. However, wh... [more] BioX2022-63 CNR2022-29
pp.7-12
ED, CPM, LQE 2021-11-26
14:55
Online Online High-breakdown-voltage Al0.36Ga0.64N-channel HFETs with a dual AlN/AlGaInN barrier layer
Akiyoshi Inoue, Sakura Tanaka, Takashi Egawa, Makoto Miyoshi (NIT) ED2021-32 CPM2021-66 LQE2021-44
In this study, we fabricated and characterized heterojunction field-effect transistors (HFETs) based on an Al0.36Ga0.64N... [more] ED2021-32 CPM2021-66 LQE2021-44
pp.79-82
SDM, ICD, ITE-IST [detail] 2021-08-18
11:00
Online Online [Invited Talk] Demonstration of HfO2-based ferroelectric ultra-thin films with low operating voltage, low process temperature, and high endurance -- Toward embedded memory in advanced technology nodes --
Kasidit Toprasertpong, Kento Tahara (Univ. Tokyo), Yukinobu Hikosaka, Ko Nakamura, Hitoshi Saito (Fujitsu Semiconductor Memory Solution), Mitsuru Takenaka, Shinichi Takagi (Univ. Tokyo) SDM2021-38 ICD2021-9
In this study, we demonstrate the importance of the thickness scaling of Hf0.5Zr0.5O2 thin films for the ferroelectric m... [more] SDM2021-38 ICD2021-9
pp.42-47
EMD, R 2021-02-12
15:00
Online Online [Invited Talk] Reliability physics issues for electronic devices -- Failure mechanisms that still need to be physically clarified --
Yasushi Kadota (RICOH Co.,Ltd.) R2020-37 EMD2020-28
Many kind of electronic devices, including semiconductor devices, have been using in various fields and applications in ... [more] R2020-37 EMD2020-28
pp.19-24
LQE, CPM, ED 2020-11-26
13:30
Online Online High-breakdown-voltage AlGaN channel HFETs with selective-area regrowth ohmic contacts
Akiyoshi Inoue, Hiroki Harada, Mizuki Yamanaka, Takashi Egawa, Makoto Miyoshi (NIT) ED2020-7 CPM2020-28 LQE2020-58
Al0.19Ga0.81N-channel metal-insulator-semiconductor (MIS) HFETs employing a quaternary AlGaInN barrier layer and a selec... [more] ED2020-7 CPM2020-28 LQE2020-58
pp.25-28
LQE, CPM, ED 2020-11-26
15:30
Online Online Enhanced Breakdown Voltage in AlGaN/GaN HEMTs by Oxygen Plasma Treatment
Shunsuke Kamiya, Takashi Nishitani, Yu Matsuda, Nozomu Takano, Joel T. Asubar, Hirokuni Tokuda (Univ. of Fukui), Masaaki Kuzuhara (Kwansei Gakuin Univ.) ED2020-12 CPM2020-33 LQE2020-63
With its high critical electric field as consequence of its wide bandgap, gallium nitride (GaN) is considered a leading ... [more] ED2020-12 CPM2020-33 LQE2020-63
pp.45-48
SDM 2020-10-22
10:50
Online Online High capacitance density high breakdown voltage textured deep trench SiN capacitors toward 3D integration
Koga Saito, Ayano Yoshida, Rihito Kuroda (Tohoku Univ.), Hiroshi Shibata, Taku Shibaguchi, Naoya kuriyama (LAPIS Semiconductor Miyagi), Shigetoshi Sugawa (Tohoku Univ.) SDM2020-15
High capacitance density and High breakdown voltage textured deep trench SiN capacitors are presented. The developed cap... [more] SDM2020-15
pp.7-11
SSS 2019-09-24
13:00
Tokyo   Analysis of dielectric breakdown characteristics for additive manufacturing materials made by selective laser sintering
Hiroaki Arai, Yuki Yamauchi, Takeshi Ueno (TIRI) SSS2019-17
Additive Manufacturing (3D printer) can easily design and make parts with complex shapes. Because of that, it is used in... [more] SSS2019-17
pp.1-4
LQE, OPE, CPM, EMD, R 2019-08-22
16:00
Miyagi   [Invited Talk] Reconsideration of TDDB Statistics of Thick Dielectric Films Used in SiC/GaN Power/RF Devices and Image Sensors
Kenji Okada (TowerJazz Panasonic Semiconductor) R2019-25 EMD2019-23 CPM2019-24 OPE2019-52 LQE2019-30
Recent advances of GaN/SiC power devices, RF/MMIC (monolithic microwave integrated circuit) devices, and also Image Sens... [more] R2019-25 EMD2019-23 CPM2019-24 OPE2019-52 LQE2019-30
pp.29-34
AI 2019-07-22
14:00
Hokkaido   Predicting Issue Weights and Detecting Breakdowns in Negotiation Dialogue
Atsuki Yamaguchi (TUAT), Kosui Iwasa (DeNA), Katsuhide Fujita (TUAT) AI2019-9
In this paper, we tackle on two tasks in the research of negotiation dialogue: 1) estimation of issue weights and detec... [more] AI2019-9
pp.45-50
WPT, MW 2019-04-22
16:30
Tokyo Kikai-Shinko-Kaikan Bldg. Simulated limitations of rectification efficiency on bridge rectifiers in 5.8GHz band
Kenji Itoh, Hiroki Kishimoto (KIT) WPT2019-9 MW2019-9
In wireless power transmission systems, improvements on efficiency and power level of rectifiers are required for wider ... [more] WPT2019-9 MW2019-9
pp.45-50
SDM 2018-06-25
16:15
Aichi Nagoya Univ. VBL3F Concern of Ferroelectric HfO2 Films Brought by Large Coercive Field
Shinji Migita, Hiroyuki Ota (AIST), Akira Toriumi (Univ. Tokyo) SDM2018-25
Ferroelectric HfO2-based thin films are attractive memory materials for application in LSI. These ferroelectrics have la... [more] SDM2018-25
pp.43-46
WPT
(2nd)
2017-12-09
- 2017-12-11
Overseas National University of Singapore(AWPT2017) Novel Extended Non-Breakdown Rectifier Topologies for Power-Optimized Waveform based Wireless Power Transfer Systems
Hao Zhang (NUST), Zheng Zhong, Yong-Xin Guo (NUS), Wen Wu (NUST)
This paper presents two novel extended non-breakdown rectifier topologies, which practically solve the rectifier?s early... [more]
LQE, CPM, ED 2017-12-01
12:30
Aichi Nagoya Inst. tech. Characterization of Chemical Structure and Electrical Properties of Remote O2 Plasma Enhanced CVD SiO2/GaN(0001) structures
NguyenXuan Truyen (Nagoya Univ.), Noriyuki Taoka (AIST GaN OIL), Akio Ohta (Nagoya Univ.), Hisashi Yamada, Tokio Takahashi (AIST GaN OIL), Mitsuhisa Ikeda, Katsunori Makihara (Nagoya Univ.), Mitsuaki Shimizu (AIST GaN OIL), Seiichi Miyazaki (Nagoya Univ.) ED2017-61 CPM2017-104 LQE2017-74
Impacts of post-deposition annealing (PDA) on interface properties in a SiO2/GaN structure formed by a remote oxygen pla... [more] ED2017-61 CPM2017-104 LQE2017-74
pp.61-64
SDM 2017-11-09
13:05
Tokyo Kikai-Shinko-Kaikan Bldg. Simple and efficient approach to improve hot carrier immunity of a p-LDMOSFET
Atsushi Sakai, Katsumi Eikyu (REL), Fujii Hiroki, Takahiro Mori (RSMC), Yutaka Akiyama, Yasuo Yamaguchi (REL) SDM2017-63
This paper proposes a simple and efficient method to improve hot carrier (HC) immunity of p-channel LDMOSFET without deg... [more] SDM2017-63
pp.11-14
CPM, LQE, ED 2016-12-12
16:10
Kyoto Kyoto University AlGaN/GaN HEMTs with High Breakdown Voltage and High Drain Current
Yudai Suzuki, Taisei Yamazaki, Shinya Makino, Joel T. Asubar, Hirokuni Tokuda, Masaaki Kuzuhara (Univ.Fukui) ED2016-64 CPM2016-97 LQE2016-80
We have studied the characteristics of off-state breakdown voltage and on-state resistance of large gate-periphery AlGaN... [more] ED2016-64 CPM2016-97 LQE2016-80
pp.35-39
HCGSYMPO
(2nd)
2016-12-07
- 2016-12-09
Kochi Kochi City Culture Plaza (CUL-PORT) Extraction of Oral Explanation Scenes by use model of Interactive contents
Nobuhiko Hama, Kenta Amahaya, Keiya Sugihara, Noboru Nakamiti (Fukuyama Univ.), Keita Watanabe (DNP Information Systems), Shouta Morita (Fukuyama Univ.)
Sometimes, explainer have to explain by oral under case of using interactive contents. We considered that oral explanati... [more]
SDM 2016-06-29
13:30
Tokyo Campus Innovation Center Tokyo A resistive switching device based on breakdown and local anodic oxidation
Kuniyuki Kakushima, Hitoshi Wakabayashi, Kazuo Tsutsui, Hiroshi Iwai (Tokyo Tech.) SDM2016-38
We propose a resistive switching device with CeOx and SiO2 stacked layers on a Si substrate. Breakdown spots are created... [more] SDM2016-38
pp.33-36
 Results 1 - 20 of 67  /  [Next]  
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