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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 13 of 13  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
OME 2023-11-01
13:55
Hyogo JIBASAN Bidg. (Himeji) Effect of pulse width modulation of illumination light on indoor photovoltaics
Kazuya Tada (Univ. Hyogo) OME2023-44
When we target the indoor use of solar cells, we have to consider the characteristics of indoor illumination light. Espe... [more] OME2023-44
pp.7-11
OPE 2013-12-20
15:00
Tokyo Kikai-Shinko-Kaikan Bldg. Metal mirror assisted grating couplers between multilayered waveguides toward 3D optical interconnects
JoonHyun Kang, Yuki Atsumi, Yusuke Hayashi, Junichi Suzuki, Yuki Kuno, Tomohiro Amemiya, Nobuhiko Nishiyama, Shigehisa Arai (Tokyo Tech) OPE2013-142
Silicon photonics for optical interconnects can further improve the signal transmission density by introducing multilaye... [more] OPE2013-142
pp.25-30
OPE 2011-12-16
15:25
Tokyo Kikai-Shinko-Kaikan Bldg. Fabrication process of multi-layered amorphous silicon wire waveguides
JoonHyun Kang, Yuki Atsumi, Manabu Oda, Nobuhiko Nishiyama, Shigehisa Arai (Titech) OPE2011-146
Silicon photonics is a promising candidate as an on-chip interconnection in LSIs. a-Si can be deposited under 300°C by P... [more] OPE2011-146
pp.27-32
SDM 2010-10-21
17:40
Miyagi Tohoku University Low-temperature crystallization of thin-film amorphous silicon
Yoko Iwakaji, Jun Hirota, Moto Yabuki, Hirokazu Ishida, Wakana Kaneko, Ichiro Mizushima, Hiroshi Akahori (Toshiba) SDM2010-158
Polysilicon are frequently used in various manufacture censor, solar cell and liquid crystal. In recent years, It comes ... [more] SDM2010-158
pp.31-34
PN 2010-09-02
13:00
Hokkaido TOYA KANKO HOTEL [Invited Talk] Silicon Photonics
Masahiko Mori, Youichi Sakakibara, Makoto Okano, Katsumi Furuya, Toshihiro Kamei, Kenji Kintaka, Yuya Shoji, Satoshi Suda, Hitoshi Kawashima (AIST) PN2010-16
Silicon Photonics, which consist of silicon core and SiO2 and/or air clad in optical waveguides, can achieve very small ... [more] PN2010-16
pp.25-30
SDM 2009-10-30
11:30
Miyagi Tohoku University Crystallization of Amorphous Silicon Films on Glass Substrate by Heated Gas Beam Annealing
Yuichiro Tanushi, Yosuke Kawano, Shin-Ichiro Kuroki, Koji Kotani (Tohoku Univ), Naomi Mura, Kimihisa Yamakami, Yuji Furumura (Philtech Inc.), Takashi Ito (Tohoku Univ) SDM2009-128
For a new novel method to crystallize amorphous silicon films on glass substrate, heated gas beam annealing method is pr... [more] SDM2009-128
pp.47-50
OPE, LQE, OCS 2009-10-23
10:15
Fukuoka   Vertical Directional Coupler Made of Amorphous Silicon Waveguides
Youichi Sakakibara, Toshihiro Kamei, Emiko Itoga, Makoto Okano, Kenji Kintaka, Yuya Shoji, Masahiko Mori (AIST) OCS2009-66 OPE2009-132 LQE2009-91
With repeated depositions of amorphous silicon thin layers three-dimensional optical wiring is possible in principle. In... [more] OCS2009-66 OPE2009-132 LQE2009-91
pp.125-129
SCE 2009-07-21
14:15
Tokyo Kikai-Shinko-Kaikan Bldg. Evaluation of MgB2 Josephson junctions with amorphous semiconductor barriers
Naoki Mitamura, Chikaze Maruyama, Hiroyuki Akaike, Akira Fujimaki (Nagoya Univ), Rintaro Ishi, Yoshihiro Niihara, Michio Naito (Tokyo Univ. of Agri. and Tech.) SCE2009-12
We have fabricated and evaluated MgB2 Josephson junctions with amorphous semiconductor barriers. We have used amorphous ... [more] SCE2009-12
pp.19-23
OPE 2008-12-19
15:20
Tokyo Kikai-Shinko-Kaikan Bldg. A spot-size converter comprised of cascaded tapers for silicon-wire waveguides
Tomohiro Ishimura, Akihiko Ohshima, Hidehiko Yoda (Utsunomiya Univ.), Chen Tsai (Univ. of CA, Irvive), Kazuo Shiraishi (Utsunomiya Univ.) OPE2008-141
A robust spot-size converter (SSC) for silicon-wire waveguides is proposed. The SSC is comprised of a horizontal linear ... [more] OPE2008-141
pp.25-29
SDM, OME 2008-04-11
11:50
Okinawa Okinawa Seinen Kaikan Application of Si Thin-Film to Photo-Sensor Device
Mitsuharu Tai, Yasutaka Konno, Mutsuko Hatano (CRL, Hitachi), Toshio Miyazawa (Hitachi Displays) SDM2008-7 OME2008-7
In order to integrate new functions into display panel, thin-film transistor is considered as photo-sensor device, and i... [more] SDM2008-7 OME2008-7
pp.33-36
CPM 2007-08-10
11:45
Yamagata Yamagata Univ. Characterization of aSi films and device simulation for solar cells
Takahiko Suzuki, Takehisa Shimakawa, Fumihiko Hirose (Yamagata Univ.) CPM2007-49
We simulated device characteristics of amorphous Si solar cells for optimizing its solar energy conversion efficiency wi... [more] CPM2007-49
pp.69-73
OME, SDM, ED 2007-04-20
13:25
Fukuoka   Very Fine Droplet Ejection from Electro-Static Inkjet Nozzle and Its Aplication to Metal Induced Crystallization of Silicon
Yuji Ishida, Gou Nakagawa, Tanemasa Asano (Kyushu Univ.) ED2007-2 SDM2007-2 OME2007-2
Droplet ejection from an electrostatic inkjet nozzle having a needle has been investigated. It is found that reducing th... [more] ED2007-2 SDM2007-2 OME2007-2
pp.5-10
SIP, ICD, IE, IPSJ-SLDM 2005-10-20
13:00
Miyagi Ichinobo, Sakunami-Spa A 2.0μm Pixel Pitch MOS Image Sensor with an Amorphous Si Film Color Filter
Masahiro Kasano, Yuichi Inaba, Mitsuyoshi Mori, Shigetaka Kasuga, Takahiko Murata, Takumi Yamaguchi (MEI)
We have developed a 2.0 x 2.0 μm2 pixel size MOS image sensor with a high aperture ratio of 30%. The key technologies ar... [more] SIP2005-105 ICD2005-124 IE2005-69
pp.55-59
 Results 1 - 13 of 13  /   
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