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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
EMD |
2019-10-18 13:30 |
Ibaraki |
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Cost reduction of C/C composite pantograph contact strip Yuki Miyahira, Yoshitaka Kubota (RTRI), Koji Hasegawa, Tatsuya Yoshii (FINE SINTER), Akio Kamezaki (CFC Design) EMD2019-37 |
(To be available after the conference date) [more] |
EMD2019-37 pp.7-12 |
SDM, OME |
2010-04-23 13:50 |
Okinawa |
Okinawa-Ken-Seinen-Kaikan Bldg. |
Characterization of Sputtered-Si Films for Photo-Sensor Diodes Jean de Dieu Mugiraneza, Tomoyuki Miyahira, Akinori Sakamoto, Takashi Noguchi (Univ. of Ryukyus), Ching-Ping Chiu, Meng-Hsin Chen, Wen-Chang Yeh (NTUST) SDM2010-8 OME2010-8 |
[more] |
SDM2010-8 OME2010-8 pp.33-37 |
SDM, ED |
2009-06-25 11:45 |
Overseas |
Haeundae Grand Hotel, Busan, Korea |
Effective Annealing for Si film Takashi Noguchi, Tomoyuki Miyahira, Yeh Chen, Jean de dieu Mugiraneza (Univ. of Ryukyus) ED2009-85 SDM2009-80 |
[more] |
ED2009-85 SDM2009-80 pp.153-156 |
OME, SDM |
2009-04-24 16:40 |
Saga |
AIST Kyushu-center |
Crystallization and annealing of heavily doped p-type Si film and electronic properties Takashi Noguchi, Tomoyuki Miyahira (Univ. of the Ryukyus), Toshiharu Suzuki (SEN) SDM2009-6 OME2009-6 |
[more] |
SDM2009-6 OME2009-6 pp.25-28 |
SDM, OME |
2008-04-11 10:35 |
Okinawa |
Okinawa Seinen Kaikan |
Electrical activation of heavily doped Si film by crystallization annealing Takashi Noguchi, Tomoyuki Miyahira, Kenji Kawai (Univ. Ryukyus), Toshiharu Suzuki, Masateru Sato (SEN) SDM2008-4 OME2008-4 |
After UV pulsed excimer laser annealing for highly
boron-, or phosphorus dosed Si film, the relationship
between the c... [more] |
SDM2008-4 OME2008-4 pp.17-22 |
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