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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2009-10-30
11:30
Miyagi Tohoku University Crystallization of Amorphous Silicon Films on Glass Substrate by Heated Gas Beam Annealing
Yuichiro Tanushi, Yosuke Kawano, Shin-Ichiro Kuroki, Koji Kotani (Tohoku Univ), Naomi Mura, Kimihisa Yamakami, Yuji Furumura (Philtech Inc.), Takashi Ito (Tohoku Univ) SDM2009-128
For a new novel method to crystallize amorphous silicon films on glass substrate, heated gas beam annealing method is pr... [more] SDM2009-128
pp.47-50
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