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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, OME 2008-04-12
11:00
Okinawa Okinawa Seinen Kaikan Microstructural Analysis of Polycrystalline Silicon Thin Films Formation Behavior during Aluminum Induced Crystallization
Ken-ichi Ikeda (Kyushu Univ.), Takeshi Hirota (Mitsubishi Heavy Industries Ltd.), Kensuke Fujimoto (Kyushu Univ.), Youhei Sugimoto (Seiko Epson Corp.), Naoki Takata (Tokyo Inst. Tech.), Seiichiro Ii (Sojo Univ.), Hideharu Nakashima, Hiroshi Nakashima (Kyushu Univ.) SDM2008-19 OME2008-19
The formation behavior of polycrystalline silicon thin films during the aluminum induced crystallization (AIC) was inves... [more] SDM2008-19 OME2008-19
pp.95-100
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