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All Technical Committee Conferences (Searched in: All Years)
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| Search Results: Conference Papers |
| Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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| Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
| OFT |
2015-12-11
15:50 |
Tokyo |
The University of Electro-Communications (Tokyo) |
Development of Active Optical Cable for Medical Device
Kengo Tanabe (SWCC Showa), Yoshiaki Sano, Shuji Suzuki (HRS), Tomotaka Murase, Takao Kaneko (SWCC Showa)  OFT2015-51 |
(Advance abstract in Japanese is available) [more] |
OFT2015-51
pp.29-33 |
| SDM, ED |
2008-07-11
14:50 |
Hokkaido |
Kaderu２・７ |
AlGaN/GaN-HEMTs on SiC with SiN Passivation Film Grown by Thermal CVD
Hideyuki Okita, Shinichi Hoshi, Toshiharu Marui, Masanori Itoh, Fumihiko Toda, Yoshiaki Morino, Isao Tamai, Yoshiaki Sano, Shohei Seki (OKI Electric Industry) ED2008-105 SDM2008-124 |
Current collapse phenomenon is a big obstacle in the AlGaN/GaN high electron mobility transistors (HEMTs), since they ha... [more] |
ED2008-105 SDM2008-124
pp.341-345 |
| ED, MW |
2008-01-16
13:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Effects of a thermal CVD SiN passivation film on electrical characteristics of AlGaN/GaN HEMTs
Toshiharu Marui, Shinichi Hoshi, Yoshiaki Morino, Masanori Itoh, Isao Tamai, Fumihiko Toda, Hideyuki Okita, Yoshiaki Sano, Shohei Seki (OKI) ED2007-208 MW2007-139 |
In AlGaN/GaN HEMTs, we used a thermal CVD SiN surface passivation film for suppressing the current collapse due to AlGaN... [more] |
ED2007-208 MW2007-139
pp.11-15 |
| ED, CPM, LQE |
2006-10-05
13:50 |
Kyoto |
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RF characteristics of AlGaN/GaN-HEMTs on Si substrates
Hideyuki Okita, Juro Mita, Yoshiaki Sano, Toshiharu Marui, Masanori Itoh, Shinichi Hoshi, Fumihiko Toda, Shohei Seki (Oki), Takashi Egawa (NIT) |
[more] |
ED2006-154 CPM2006-91 LQE2006-58
pp.13-18 |
| ED, MW |
2006-01-19
13:45 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
AlGaN/GaN-HEMTs with Recessed Ohmic Electrodes on Si
Juro Mita, Katsuaki Kaifu, Masanori Itoh, Yoshiaki Sano (Oki), Hiroyasu Ishikawa, Takashi Egawa (Nitech) |
[more] |
ED2005-204 MW2005-158
pp.29-34 |
| MW, ED |
2005-01-18
10:45 |
Tokyo |
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Masanori Itoh, Katsuaki Kaifu, Juro Mita, Hideyuki Okita, Fumihiko Toda, Yoshiaki Sano, Shohei Seki (OKI), Hiroyasu Ishikawa, Takashi Egawa (Nagoya Inst. of Tech.) |
[more] |
ED2004-215 MW2004-222
pp.19-24 |
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